Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

Oscar Versolato*, Alex Bayerle, Muharrem Bayraktar, Lars Behnke, H. Bekker, Zoi Bouza, James Colgan, J Crespo Lopez-Urrutia, M J Deuzeman, R. Hoekstra, Dmitry Kurilovich, L Poirier, Bo Liu, Randy Meijer, Amanda Neukirch, S Rai, A Ryabtsev, S. Witte, Joris Scheers, Ruben SchuppJ. Sheil, Francesco Torretti, W. Ubachs

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

17 Downloads (Pure)

Abstract

Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laserdriven plasma and present a surprising answer to the key question: what makes that light?

Original languageEnglish
Title of host publicationJournal of Physics: Conference Series
Subtitle of host publicationPlasmas & Particle acceleration
Volume1412
Edition19
DOIs
Publication statusPublished - 11 Jun 2020
EventXXXIst International Conference on Photonic, Electronic, and Atomic Collisions 2019 - Centre International de Deauville, Deauville, France
Duration: 23 Jul 201930 Jul 2019
Conference number: 31
http://www.icpeac2019.fr/

Publication series

NameJournal of physics: Conference series
PublisherIOP Publishing Ltd.
ISSN (Print)1742-6588

Conference

ConferenceXXXIst International Conference on Photonic, Electronic, and Atomic Collisions 2019
Abbreviated titleICPEAC 2019
CountryFrance
CityDeauville
Period23/07/1930/07/19
Internet address

Fingerprint

Dive into the research topics of 'Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography'. Together they form a unique fingerprint.

Cite this