Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

Oscar Versolato*, Alex Bayerle, Muharrem Bayraktar, Lars Behnke, H. Bekker, Zoi Bouza, James Colgan, J Crespo Lopez-Urrutia, M J Deuzeman, R. Hoekstra, Dmitry Kurilovich, L Poirier, Bo Liu, Randy Meijer, Amanda Neukirch, S Rai, A Ryabtsev, S. Witte, Joris Scheers, Ruben SchuppJ. Sheil, Francesco Torretti, W. Ubachs

*Corresponding author for this work

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