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Spin-Polarized Tunneling through Chemical Vapor Deposited Multilayer Molybdenum Disulfide

  • Andre Dankert
  • , Parham Pashaei
  • , M. Venkata Kamalakar
  • , Anand P. S. Gaur
  • , Satyaprakash Sahoo
  • , Ivan Rungger
  • , Awadhesh Narayan
  • , Kapildeb Dolui
  • , Md. Anamul Hoque
  • , Ram Shanker Patel
  • , Machiel Pieter de Jong
  • , Ram S. Katiyar
  • , Stefano Sanvito
  • , Saroj P. Dash

    Research output: Contribution to journalArticleAcademicpeer-review

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    Abstract

    The two-dimensional (2D) semiconductor molybdenum disulfide (MoS2) has attracted widespread attention for its extraordinary electrical-, optical-, spin-, and valley-related properties. Here, we report on spin-polarized tunneling through chemical vapor deposited multilayer MoS2 (∼7 nm) at room temperature in a vertically fabricated spin-valve device. A tunnel magnetoresistance (TMR) of 0.5–2% has been observed, corresponding to spin polarization of 5–10% in the measured temperature range of 300–75 K. First-principles calculations for ideal junctions result in a TMR up to 8% and a spin polarization of 26%. The detailed measurements at different temperature, bias voltages, and density functional theory calculations provide information about spin transport mechanisms in vertical multilayer MoS2 spin-valve devices. These findings form a platform for exploring spin functionalities in 2D semiconductors and understanding the basic phenomena that control their performance.
    Original languageEnglish
    Pages (from-to)6389-6395
    JournalACS nano
    Volume11
    Issue number6
    DOIs
    Publication statusPublished - Jun 2017

    Keywords

    • spin-polarized tunneling
    • multilayer MoS2
    • 2D semiconductor
    • tunnel magnetoresistance
    • density functional theory

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