Spontaneous emission at 193 nm and gain measurements in F2 containing excimer gas mixtures

A.V. Azarov, P.J.M. Peters, Klaus J. Boller

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The net gain and spontaneous emission at 193 nm have been measured in x-ray pre-ionized discharges excited by a single pulse charge transfer scheme in Ar and F2 containing mixtures with He and Ne as a buffer gas. With a pumping pulse of ~ 100 ns (FWHM) and a specific peak power deposition of ~ 1 MW cm-3 bar-1 in a gas mixture containing F2 : Ar : He (0.1% : 5% : 94.9%) at 2 bar total pressure the spontaneous emission with a peak intensity of ~ 200 W srad-1 and a pulse width (FWHM) of ~ 60 ns was measured. The net gain profile with a peak value ~ 20% cm-1 and a pulse width FWHM ~ 60 ns has been obtained under the same pumping conditions.
Original languageEnglish
Title of host publicationXVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
EditorsDieter Schuöcker
Place of PublicationBellingham, Washington, USA
PublisherSPIE - The International Society for Optical Engineering
Pages63460O-1-63460O-8
ISBN (Print)9780819464309
DOIs
Publication statusPublished - 4 Sep 2007
EventXVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers - Bellingham, Washington, USA
Duration: 4 Sep 20068 Sep 2006

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume6346
ISSN (Print)0277-786X

Conference

ConferenceXVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers
CityBellingham, Washington, USA
Period4/09/068/09/06

Keywords

  • METIS-240166
  • IR-96126

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