Stability of oriented silicalite-1 films in view of zeolite membrane preparation

M.J. den Exter, H. van Bekkum, C.J.M. van Rijn, F. Kapteijn, J.A. Moulijn, H. Schellevis, C.I.N. Beenakker

    Research output: Contribution to journalArticleAcademicpeer-review

    126 Citations (Scopus)
    199 Downloads (Pure)


    Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible.
    Original languageEnglish
    Pages (from-to)13-20
    Issue number1
    Publication statusPublished - 1997


    • METIS-111501
    • IR-14228


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