Stability of oriented silicalite-1 films in view of zeolite membrane preparation

M.J. den Exter; H. van Bekkum; C.J.M. van Rijn; F. Kapteijn; J.A. Moulijn; H. Schellevis; C.I.N. Beenakker

doi:10.1016/S0144-2449(97)00044-4

Stability of oriented silicalite-1 films in view of zeolite membrane preparation

M.J. den Exter, H. van Bekkum, C.J.M. van Rijn, F. Kapteijn, J.A. Moulijn, H. Schellevis, C.I.N. Beenakker

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Abstract

Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible.

Original language	English
Pages (from-to)	13-20
Journal	Zeolites
Volume	19
Issue number	1
DOIs	https://doi.org/10.1016/S0144-2449(97)00044-4
Publication status	Published - 1997

Keywords

METIS-111501
IR-14228

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10.1016/S0144-2449(97)00044-4

Exter97stabilityFinal published version, 946 KB

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@article{41c0c6961e4f45f6b7564df752666826,

title = "Stability of oriented silicalite-1 films in view of zeolite membrane preparation",

abstract = "Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible.",

keywords = "METIS-111501, IR-14228",

author = "{den Exter}, M.J. and {van Bekkum}, H. and {van Rijn}, C.J.M. and F. Kapteijn and J.A. Moulijn and H. Schellevis and C.I.N. Beenakker",

year = "1997",

doi = "10.1016/S0144-2449(97)00044-4",

language = "English",

volume = "19",

pages = "13--20",

journal = "Zeolites",

issn = "0144-2449",

publisher = "Elsevier",

number = "1",

}

TY - JOUR

T1 - Stability of oriented silicalite-1 films in view of zeolite membrane preparation

AU - den Exter, M.J.

AU - van Bekkum, H.

AU - van Rijn, C.J.M.

AU - Kapteijn, F.

AU - Moulijn, J.A.

AU - Schellevis, H.

AU - Beenakker, C.I.N.

PY - 1997

Y1 - 1997

N2 - Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible.

AB - Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible.

KW - METIS-111501

KW - IR-14228

U2 - 10.1016/S0144-2449(97)00044-4

DO - 10.1016/S0144-2449(97)00044-4

M3 - Article

VL - 19

SP - 13

EP - 20

JO - Zeolites

JF - Zeolites

SN - 0144-2449

IS - 1

ER -

Stability of oriented silicalite-1 films in view of zeolite membrane preparation

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Keywords

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