Static friction in elastic adhesive MEMS contacts, models and experiment

Niels Roelof Tas; C. Gui; Michael Curt Elwenspoek

doi:10.1109/MEMSYS.2000.838515

Static friction in elastic adhesive MEMS contacts, models and experiment

Niels Roelof Tas, C. Gui, Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

19 Citations (Scopus)

194 Downloads (Pure)

Abstract

Static friction in shearing mode can be expressed as the product of the shear strength of the interface and the real contact area. The influence of roughness on friction in elastic adhesive contact is analyzed. Special attention is paid to low loading conditions, in which the number of contact points is small. The models are used to analyze a friction experiment in a MEMS friction meter.

Original language	Undefined
Title of host publication	Proceedings of the IEEE Micro Electro Mechanical Systems
Place of Publication	Piscataway
Publisher	IEEE
Pages	193-198
Number of pages	6
ISBN (Print)	0-7803-5273-4
DOIs	https://doi.org/10.1109/MEMSYS.2000.838515
Publication status	Published - 23 Jan 2000
Event	13th Annual International Conference on Micro Electro Mechanical Systems, MEMS 2000 - Miyazaki, Japan Duration: 23 Jan 2000 → 27 Jan 2000 Conference number: 13

Publication series

Name
Publisher	IEEE

Conference

Conference	13th Annual International Conference on Micro Electro Mechanical Systems, MEMS 2000
Abbreviated title	MEMS
Country/Territory	Japan
City	Miyazaki
Period	23/01/00 → 27/01/00

Keywords

METIS-113068
EWI-13186
IR-16183

Access to Document

10.1109/MEMSYS.2000.838515

Cite this

@inproceedings{21cc1384e5b24243b00a5ba60c93582b,

title = "Static friction in elastic adhesive MEMS contacts, models and experiment",

abstract = "Static friction in shearing mode can be expressed as the product of the shear strength of the interface and the real contact area. The influence of roughness on friction in elastic adhesive contact is analyzed. Special attention is paid to low loading conditions, in which the number of contact points is small. The models are used to analyze a friction experiment in a MEMS friction meter.",

keywords = "METIS-113068, EWI-13186, IR-16183",

author = "Tas, {Niels Roelof} and C. Gui and Elwenspoek, {Michael Curt}",

year = "2000",

month = jan,

day = "23",

doi = "10.1109/MEMSYS.2000.838515",

language = "Undefined",

isbn = "0-7803-5273-4",

publisher = "IEEE",

pages = "193--198",

booktitle = "Proceedings of the IEEE Micro Electro Mechanical Systems",

address = "United States",

note = "13th Annual International Conference on Micro Electro Mechanical Systems, MEMS 2000 ; Conference date: 23-01-2000 Through 27-01-2000",

}

TY - GEN

T1 - Static friction in elastic adhesive MEMS contacts, models and experiment

AU - Tas, Niels Roelof

AU - Gui, C.

AU - Elwenspoek, Michael Curt

N1 - Conference code: 13

PY - 2000/1/23

Y1 - 2000/1/23

N2 - Static friction in shearing mode can be expressed as the product of the shear strength of the interface and the real contact area. The influence of roughness on friction in elastic adhesive contact is analyzed. Special attention is paid to low loading conditions, in which the number of contact points is small. The models are used to analyze a friction experiment in a MEMS friction meter.

AB - Static friction in shearing mode can be expressed as the product of the shear strength of the interface and the real contact area. The influence of roughness on friction in elastic adhesive contact is analyzed. Special attention is paid to low loading conditions, in which the number of contact points is small. The models are used to analyze a friction experiment in a MEMS friction meter.

KW - METIS-113068

KW - EWI-13186

KW - IR-16183

U2 - 10.1109/MEMSYS.2000.838515

DO - 10.1109/MEMSYS.2000.838515

M3 - Conference contribution

SN - 0-7803-5273-4

SP - 193

EP - 198

BT - Proceedings of the IEEE Micro Electro Mechanical Systems

PB - IEEE

CY - Piscataway

T2 - 13th Annual International Conference on Micro Electro Mechanical Systems, MEMS 2000

Y2 - 23 January 2000 through 27 January 2000

ER -