Statistical relation between particle contaminations in ultra pure water and defects generated by process tools

F. Wali, D. Martin Knotter, Ronald Wortelboer, Auke Mud

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    Abstract

    Ultra pure water supplied inside the Fab is used in different tools at different stages of processing. Data of the particles measured in ultra pure water was compared with the defect density on wafers processed on these tools and a statistical relation is found Keywords— Yield, defect density, particles, ultra-pure water
    Original languageUndefined
    Title of host publication10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
    Place of PublicationUtrecht, The Netherlands
    PublisherSTW
    Pages555-557
    Number of pages3
    ISBN (Print)978-90-73461-49-9
    Publication statusPublished - 29 Nov 2007
    Event10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2007 - Veldhoven, Netherlands
    Duration: 29 Nov 200730 Nov 2007

    Publication series

    Name
    PublisherTechnology Foundation STW
    Number7

    Workshop

    Workshop10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2007
    CountryNetherlands
    CityVeldhoven
    Period29/11/0730/11/07

    Keywords

    • SC-ICRY: Integrated Circuit Reliability and Yield
    • Yield
    • Ultra pure water
    • METIS-245950
    • EWI-11743
    • IR-64584
    • Defect density
    • Particles

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