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Stoichiometry control in oxide thin films by pulsed laser deposition
Rik Groenen
Inorganic Materials Science
Research output
:
Thesis
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PhD Thesis - Research UT, graduation UT
741
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Dive into the research topics of 'Stoichiometry control in oxide thin films by pulsed laser deposition'. Together they form a unique fingerprint.
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Physics
Oxygen
100%
Stoichiometry
100%
Thin Films
100%
Pulsed Laser Deposition
100%
Oxide
100%
Gaseous State
66%
Substrates
66%
Growth
50%
Targets
50%
Oxidation
50%
Plum
33%
Laser
33%
Shapes
16%
Laser Induced Fluorescence
16%
Optical Emission Spectroscopy
16%
Foci
16%
Pulsed Laser
16%
Vacuum
16%
Metal
16%
Material Science
Pulsed Laser Deposition
100%
Oxide
100%
Thin Films
100%
Film
80%
Gas
80%
Material
60%
Laser
60%
Oxidation Reaction
60%
Surface
40%
Nanocrystalline Material
20%
Crystalline Material
20%
Film Growth
20%
Emission Spectroscopy
20%
Structure (Composition)
20%
Metal Oxide
20%
Thin Film Property
20%
Chemical Property
20%
Laser Induced Fluorescence
20%
Chemistry
Liquid Film
100%
Oxide
100%
Pulsed Laser Deposition
100%
Reaction Stoichiometry
100%
Dioxygen
66%
Gas
44%
Plasma
44%
Phase Composition
33%
Oxidation Reaction
33%
Chemistry
22%
Surface
22%
Laser Induced Fluorescence Spectroscopy
11%
Synthesis (Chemical)
11%
Nanomaterial
11%
Compound Mobility
11%
Optical Emission Spectroscopy
11%
Vacuum Chamber
11%
Procedure
11%
Metal Oxide
11%
Structure
11%