Stress development in thin yttrium films on hard substrates during hydrogen loading

M. Dornheim; A. Pundt; R. Kirchheim; S.J. van der Molen; Ernst S. Kooij; J.W.J. Kerssemakers; R. Griessen; H. Harms; U. Geyer

Stress development in thin yttrium films on hard substrates during hydrogen loading

M. Dornheim, A. Pundt, R. Kirchheim, S.J. van der Molen, Ernst S. Kooij, J.W.J. Kerssemakers, R. Griessen, H. Harms, U. Geyer

Physics of Interfaces and Nanomaterials

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined
Pages (from-to)	8958-8965
Number of pages	8
Journal	Journal of Applied Physics
Volume	93
Issue number	11
Publication status	Published - 2003

Keywords

METIS-214534

Cite this

@article{e084530edf29487cac816b10cb371340,

title = "Stress development in thin yttrium films on hard substrates during hydrogen loading",

keywords = "METIS-214534",

author = "M. Dornheim and A. Pundt and R. Kirchheim and {van der Molen}, S.J. and Kooij, {Ernst S.} and J.W.J. Kerssemakers and R. Griessen and H. Harms and U. Geyer",

year = "2003",

language = "Undefined",

volume = "93",

pages = "8958--8965",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "11",

}

TY - JOUR

T1 - Stress development in thin yttrium films on hard substrates during hydrogen loading

AU - Dornheim, M.

AU - Pundt, A.

AU - Kirchheim, R.

AU - van der Molen, S.J.

AU - Kooij, Ernst S.

AU - Kerssemakers, J.W.J.

AU - Griessen, R.

AU - Harms, H.

AU - Geyer, U.

PY - 2003

Y1 - 2003

KW - METIS-214534

M3 - Article

SN - 0021-8979

VL - 93

SP - 8958

EP - 8965

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -