Stress mitigation in Mo/Si multilayers for EUV lithography

E. Zoethout*, G. Sipos, R. W.E. Van De Kruijs, A. E. Yakshin, E. Louis, S. Müllender, F. Bijkerk

*Corresponding author for this work

Research output: Contribution to journalConference articleAcademicpeer-review

26 Citations (Scopus)

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