Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance

Research output: Other contributionOther research output

Abstract

Theoretically a transition metal (TM) interlayer of sub nanometer thickness on top of Mo can improve the dielectric distribution in Mo/Si multilayer structures such, that the EUV reflection at 13.5 nm is increased. To learn the actual effect, the structure and optical properties of B4C/Mo/TM/Si multilayer systems were studied. X-ray reflectometry, AR-XPS and EXAFS at the Mo and transition metal K-edge were used to investigate average interface roughness of the multilayer period and morphology of the transition metal layer and Mo/TM interface. Furthermore EXAFS was used to study the effect of a thin interlayer upon the Mo-silicide formation, suggesting enhanced optical contrast.
Original languageEnglish
Place of PublicationVeldhoven, Netherlands
Publication statusPublished - 2011

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transition metals
mirrors
reflectance
interlayers
laminates
roughness
optical properties
metals
x rays

Keywords

  • METIS-304943

Cite this

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title = "Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance",
abstract = "Theoretically a transition metal (TM) interlayer of sub nanometer thickness on top of Mo can improve the dielectric distribution in Mo/Si multilayer structures such, that the EUV reflection at 13.5 nm is increased. To learn the actual effect, the structure and optical properties of B4C/Mo/TM/Si multilayer systems were studied. X-ray reflectometry, AR-XPS and EXAFS at the Mo and transition metal K-edge were used to investigate average interface roughness of the multilayer period and morphology of the transition metal layer and Mo/TM interface. Furthermore EXAFS was used to study the effect of a thin interlayer upon the Mo-silicide formation, suggesting enhanced optical contrast.",
keywords = "METIS-304943",
author = "J. Bosgra and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and E. Zoethout and J. Verhoeven and Andrey Yakshin and Frederik Bijkerk",
year = "2011",
language = "English",
type = "Other",

}

Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance. / Bosgra, J.; van de Kruijs, Robbert Wilhelmus Elisabeth; Zoethout, E.; Verhoeven, J.; Yakshin, Andrey; Bijkerk, Frederik.

Veldhoven, Netherlands. 2011, .

Research output: Other contributionOther research output

TY - GEN

T1 - Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance

AU - Bosgra, J.

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Zoethout, E.

AU - Verhoeven, J.

AU - Yakshin, Andrey

AU - Bijkerk, Frederik

PY - 2011

Y1 - 2011

N2 - Theoretically a transition metal (TM) interlayer of sub nanometer thickness on top of Mo can improve the dielectric distribution in Mo/Si multilayer structures such, that the EUV reflection at 13.5 nm is increased. To learn the actual effect, the structure and optical properties of B4C/Mo/TM/Si multilayer systems were studied. X-ray reflectometry, AR-XPS and EXAFS at the Mo and transition metal K-edge were used to investigate average interface roughness of the multilayer period and morphology of the transition metal layer and Mo/TM interface. Furthermore EXAFS was used to study the effect of a thin interlayer upon the Mo-silicide formation, suggesting enhanced optical contrast.

AB - Theoretically a transition metal (TM) interlayer of sub nanometer thickness on top of Mo can improve the dielectric distribution in Mo/Si multilayer structures such, that the EUV reflection at 13.5 nm is increased. To learn the actual effect, the structure and optical properties of B4C/Mo/TM/Si multilayer systems were studied. X-ray reflectometry, AR-XPS and EXAFS at the Mo and transition metal K-edge were used to investigate average interface roughness of the multilayer period and morphology of the transition metal layer and Mo/TM interface. Furthermore EXAFS was used to study the effect of a thin interlayer upon the Mo-silicide formation, suggesting enhanced optical contrast.

KW - METIS-304943

M3 - Other contribution

CY - Veldhoven, Netherlands

ER -