Structure of high-reflectance La/B-based multilayer mirrors with partial La nitridation

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Abstract

We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of La/B based nanoscale multilayer structures to be used as Extreme UV mirrors at 6.7 nm wavelength and beyond. We have analyzed the La-nitridation process in detail, and proposed a growth mechanism and deposition procedure for full, stoichiometric passivation of La, avoiding the formation of optically unfavorable BN formation at the LaN-on-B interface. A partial nitridation was applied and studied as a function of the nitridation delay.
Original languageEnglish
Article number115117
Number of pages9
JournalAIP advances
Volume6
DOIs
Publication statusPublished - 2016

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Keywords

  • METIS-318716
  • IR-102000

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