Abstract
We investigate a hybrid thin film deposition procedure that significantly enhances reflectivity of La/B based nanoscale multilayer structures to be used as Extreme UV mirrors at 6.7 nm wavelength and beyond. We have analyzed the La-nitridation process in detail, and proposed a growth mechanism and deposition procedure for full, stoichiometric passivation of La, avoiding the formation of optically unfavorable BN formation at the LaN-on-B interface. A partial nitridation was applied and studied as a function of the nitridation delay.
Original language | English |
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Article number | 115117 |
Number of pages | 9 |
Journal | AIP advances |
Volume | 6 |
DOIs | |
Publication status | Published - 2016 |
Keywords
- METIS-318716
- IR-102000