Sub-10 nm silicon ridge nanofabrication by advanced edge lithography for NIL applications

Yiping Zhao, Johan W. Berenschot, Henricus V. Jansen, Niels Roelof Tas, Jurriaan Huskens, Michael Curt Elwenspoek

Research output: Contribution to journalArticleAcademicpeer-review

44 Citations (Scopus)
6 Downloads (Pure)

Fingerprint

Dive into the research topics of 'Sub-10 nm silicon ridge nanofabrication by advanced edge lithography for NIL applications'. Together they form a unique fingerprint.

Material Science

Engineering