Subatomic accuracy in EUVL multilayer coatings

E. Zoethout*, P. Suter, R. W.E. Van De Kruijs, A. E. Yakshin, E. Louis, F. Bijkerk, H. Enkisch, S. Müllender

*Corresponding author for this work

Research output: Contribution to journalConference articleAcademicpeer-review

3 Citations (Scopus)

Abstract

Reported is the production of multilayer EUV coatings on 25000 mm 2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

Original languageEnglish
Pages (from-to)892-896
Number of pages5
JournalProceedings of SPIE - the international society for optical engineering
Volume5374
Issue numberPART 2
DOIs
Publication statusPublished - 18 Aug 2004
Externally publishedYes
EventEmerging Lithographic Technologies VIII 2004 - Santa Clara, United States
Duration: 24 Feb 200426 Feb 2004
Conference number: 8

Keywords

  • EUV Lithography
  • Mo/Si multilayers

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