Subatomic accuracy in EUVL multilayer coatings

E. Zoethout; P. Suter; R.W.E. van de Kruijs; A.E. Yakshin; E. Louis; F. Bijkerk; H. Enkisch; S. Müllender

doi:10.1117/12.561319

Subatomic accuracy in EUVL multilayer coatings

E. Zoethout^*
, P. Suter
, R.W.E. van de Kruijs
, A.E. Yakshin
, E. Louis
, F. Bijkerk
, H. Enkisch
, S. Müllender

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › Academic › peer-review

3 Citations (Scopus)

Abstract

Reported is the production of multilayer EUV coatings on 25000 mm ² large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

Original language	English
Pages (from-to)	892-896
Number of pages	5
Journal	Proceedings of SPIE - the international society for optical engineering
Volume	5374
Issue number	PART 2
DOIs	https://doi.org/10.1117/12.561319
Publication status	Published - 18 Aug 2004
Externally published	Yes
Event	Emerging Lithographic Technologies VIII 2004 - Santa Clara, United States Duration: 24 Feb 2004 → 26 Feb 2004 Conference number: 8

Keywords

EUV Lithography
Mo/Si multilayers

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10.1117/12.561319

Cite this

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title = "Subatomic accuracy in EUVL multilayer coatings",

abstract = "Reported is the production of multilayer EUV coatings on 25000 mm 2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.",

keywords = "EUV Lithography, Mo/Si multilayers",

author = "E. Zoethout and P. Suter and \{van de Kruijs\}, R.W.E. and A.E. Yakshin and E. Louis and F. Bijkerk and H. Enkisch and S. M{\"u}llender",

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doi = "10.1117/12.561319",

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volume = "5374",

pages = "892--896",

journal = "Proceedings of SPIE - the international society for optical engineering",

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TY - JOUR

T1 - Subatomic accuracy in EUVL multilayer coatings

AU - Zoethout, E.

AU - Suter, P.

AU - van de Kruijs, R.W.E.

AU - Yakshin, A.E.

AU - Louis, E.

AU - Bijkerk, F.

AU - Enkisch, H.

AU - Müllender, S.

N1 - Conference code: 8

PY - 2004/8/18

Y1 - 2004/8/18

N2 - Reported is the production of multilayer EUV coatings on 25000 mm 2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

AB - Reported is the production of multilayer EUV coatings on 25000 mm 2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

KW - EUV Lithography

KW - Mo/Si multilayers

UR - https://www.scopus.com/pages/publications/3843150394

U2 - 10.1117/12.561319

DO - 10.1117/12.561319

M3 - Conference article

AN - SCOPUS:3843150394

SN - 0277-786X

VL - 5374

SP - 892

EP - 896

JO - Proceedings of SPIE - the international society for optical engineering

JF - Proceedings of SPIE - the international society for optical engineering

IS - PART 2

T2 - Emerging Lithographic Technologies VIII 2004

Y2 - 24 February 2004 through 26 February 2004

ER -

Subatomic accuracy in EUVL multilayer coatings

Abstract

Keywords

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