Surface and sub-surface thermal oxidation of ruthenium thin films

R. Coloma Ribera; Robbert Wilhelmus Elisabeth van de Kruijs; E. Zoethout; Andrey Yakshin; Frederik Bijkerk

Surface and sub-surface thermal oxidation of ruthenium thin films

R. Coloma Ribera, Robbert Wilhelmus Elisabeth van de Kruijs, E. Zoethout, Andrey Yakshin, Frederik Bijkerk

XUV Optics

Research output: Contribution to conference › Poster

Abstract

For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.

Original language	English
Pages	-
Publication status	Published - 21 Jan 2014
Event	Physics@FOM Veldhoven 2014 - Veldhoven, Netherlands Duration: 21 Jan 2014 → 22 Jan 2014

Conference

Conference	Physics@FOM Veldhoven 2014
Country	Netherlands
City	Veldhoven
Period	21/01/14 → 22/01/14

Keywords

METIS-303765

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Coloma Ribera, R., van de Kruijs, R. W. E., Zoethout, E., Yakshin, A., & Bijkerk, F. (2014). Surface and sub-surface thermal oxidation of ruthenium thin films. -. Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.

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abstract = "For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.",

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author = "{Coloma Ribera}, R. and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and E. Zoethout and Andrey Yakshin and Frederik Bijkerk",

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T1 - Surface and sub-surface thermal oxidation of ruthenium thin films

AU - Coloma Ribera, R.

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Zoethout, E.

AU - Yakshin, Andrey

AU - Bijkerk, Frederik

PY - 2014/1/21

Y1 - 2014/1/21

N2 - For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.

AB - For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.

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