Surface and sub-surface thermal oxidation of ruthenium thin films

Research output: Contribution to conferencePosterOther research output

Abstract

For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.
Original languageEnglish
Pages-
Publication statusPublished - 21 Jan 2014
EventPhysics@FOM Veldhoven 2014 - Veldhoven, Netherlands
Duration: 21 Jan 201422 Jan 2014

Conference

ConferencePhysics@FOM Veldhoven 2014
CountryNetherlands
CityVeldhoven
Period21/01/1422/01/14

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ruthenium
oxidation
thin films
atomic force microscopy
x rays
photolithography
density distribution
surface layers
contamination
nucleation
coatings
oxides
metals
temperature

Keywords

  • METIS-303765

Cite this

Coloma Ribera, R., van de Kruijs, R. W. E., Zoethout, E., Yakshin, A., & Bijkerk, F. (2014). Surface and sub-surface thermal oxidation of ruthenium thin films. -. Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.
Coloma Ribera, R. ; van de Kruijs, Robbert Wilhelmus Elisabeth ; Zoethout, E. ; Yakshin, Andrey ; Bijkerk, Frederik. / Surface and sub-surface thermal oxidation of ruthenium thin films. Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.
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abstract = "For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.",
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Coloma Ribera, R, van de Kruijs, RWE, Zoethout, E, Yakshin, A & Bijkerk, F 2014, 'Surface and sub-surface thermal oxidation of ruthenium thin films' Physics@FOM Veldhoven 2014, Veldhoven, Netherlands, 21/01/14 - 22/01/14, pp. -.

Surface and sub-surface thermal oxidation of ruthenium thin films. / Coloma Ribera, R.; van de Kruijs, Robbert Wilhelmus Elisabeth; Zoethout, E.; Yakshin, Andrey; Bijkerk, Frederik.

2014. - Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.

Research output: Contribution to conferencePosterOther research output

TY - CONF

T1 - Surface and sub-surface thermal oxidation of ruthenium thin films

AU - Coloma Ribera, R.

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Zoethout, E.

AU - Yakshin, Andrey

AU - Bijkerk, Frederik

PY - 2014/1/21

Y1 - 2014/1/21

N2 - For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.

AB - For next generation Extreme UV photolithography, multilayer coatings may require protective capping layers against surface contamination. Ruthenium, as a low-oxidation metal, is often used as a reference material. The oxidation behaviour of Ru thin films has been studied using X-ray reflectometry (XRR) and Atomic force microscopy (AFM). XRR is sensitive to the in-depth electron density distribution and as such to the formation of ruthenium oxides. In-situ XRR during atmospheric oxidation reveals formation of a low density RuOX layer near the surface, followed by sub-surface formation of a high density RuOX layer. Surprisingly, the ratio between RuOX formation and Ru consumption is only 1.2, in contrast to the value of 2.3 reported in literature. AFM studies show that the “missing” RuOX is found in surface agglomerates that grow with increasing oxidation temperature and duration. These agglomerates appear around 200˚C, consistent with RuO2 nucleation and growth reported in literature.

KW - METIS-303765

M3 - Poster

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Coloma Ribera R, van de Kruijs RWE, Zoethout E, Yakshin A, Bijkerk F. Surface and sub-surface thermal oxidation of ruthenium thin films. 2014. Poster session presented at Physics@FOM Veldhoven 2014, Veldhoven, Netherlands.