Suspended membranes, cantilevers and beams using SU-8 foils

J. Melai, V.M. Blanco Carballo, Cora Salm, Jurriaan Schmitz

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    4 Citations (Scopus)

    Abstract

    This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams
    Original languageUndefined
    Article number10.1016/j.mee.2009.10.035
    Pages (from-to)1274-1277
    Number of pages4
    JournalMicroelectronic engineering
    Volume87
    Issue number5-8
    DOIs
    Publication statusPublished - 26 Feb 2010

    Keywords

    • SC-RID: Radiation Imaging detectors
    • Wafer post-processing
    • Surface micromachining
    • EWI-17618
    • Channel
    • IR-70169
    • Cavity
    • SU-8
    • MEMS
    • METIS-270750
    • Cantilever
    • CMOS
    • Foil

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