Abstract
This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams
Original language | English |
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Pages (from-to) | 1274-1277 |
Number of pages | 4 |
Journal | Microelectronic engineering |
Volume | 87 |
Issue number | 5-8 |
DOIs | |
Publication status | Published - 26 Feb 2010 |
Keywords
- SC-RID: Radiation Imaging detectors
- Wafer post-processing
- Surface micromachining
- Channel
- Cavity
- SU-8
- MEMS
- Cantilever
- CMOS
- Foil