Suspended membranes, cantilevers and beams using SU-8 foils

J. Melai; V.M. Blanco Carballo; Cora Salm; Jurriaan Schmitz

doi:10.1016/j.mee.2009.10.035

Suspended membranes, cantilevers and beams using SU-8 foils

J. Melai
, V.M. Blanco Carballo
, Cora Salm
, Jurriaan Schmitz

Research output: Contribution to journal › Article › Academic › peer-review

4 Citations (Scopus)

5 Downloads (Pure)

Abstract

This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams

Original language	English
Pages (from-to)	1274-1277
Number of pages	4
Journal	Microelectronic engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.10.035
Publication status	Published - 26 Feb 2010

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

SC-RID: Radiation Imaging detectors
Wafer post-processing
Surface micromachining
Channel
Cavity
SU-8
MEMS
Cantilever
CMOS
Foil

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10.1016/j.mee.2009.10.035

Cite this

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title = "Suspended membranes, cantilevers and beams using SU-8 foils",

abstract = "This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams",

keywords = "SC-RID: Radiation Imaging detectors, Wafer post-processing, Surface micromachining, Channel, Cavity, SU-8, MEMS, Cantilever, CMOS, Foil",

author = "J. Melai and \{Blanco Carballo\}, V.M. and Cora Salm and Jurriaan Schmitz",

note = "10.1016/j.mee.2009.10.035 ",

year = "2010",

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doi = "10.1016/j.mee.2009.10.035",

language = "English",

volume = "87",

pages = "1274--1277",

journal = "Microelectronic engineering",

issn = "0167-9317",

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TY - JOUR

T1 - Suspended membranes, cantilevers and beams using SU-8 foils

AU - Melai, J.

AU - Blanco Carballo, V.M.

AU - Salm, Cora

AU - Schmitz, Jurriaan

N1 - 10.1016/j.mee.2009.10.035

PY - 2010/2/26

Y1 - 2010/2/26

N2 - This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams

AB - This paper presents a fast, easy and low-cost method to create suspended structures using SU-8 photoresist. The method consists of laminating SU-8 foils on top of previously defined topographies, followed by SU-8 foil patterning. This surface-micromachining approach has been successfully employed to fabricate a variety of structures, including high-voltage electrodes over CMOS chips, stacked vias, closed cavities, channels, cantilevers and double-clamped beams

KW - SC-RID: Radiation Imaging detectors

KW - Wafer post-processing

KW - Surface micromachining

KW - Channel

KW - Cavity

KW - SU-8

KW - MEMS

KW - Cantilever

KW - CMOS

KW - Foil

U2 - 10.1016/j.mee.2009.10.035

DO - 10.1016/j.mee.2009.10.035

M3 - Article

SN - 0167-9317

VL - 87

SP - 1274

EP - 1277

JO - Microelectronic engineering

JF - Microelectronic engineering

IS - 5-8

ER -

Suspended membranes, cantilevers and beams using SU-8 foils

Abstract

UN SDGs

Keywords

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