Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

C. Brombacher, M. Saitner, C. Pfahler, A. Plettl, P. Ziemann, D. Makarov, D. Assmann, Martin Herman Siekman, Leon Abelmann, M. Albrecht

    Research output: Contribution to journalArticleAcademicpeer-review

    18 Citations (Scopus)

    Abstract

    Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film–particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.
    Original languageUndefined
    Article number10.1088/0957-4484/20/10/105304
    Pages (from-to)105304-105308
    Number of pages6
    JournalNanotechnology
    Volume20
    Issue number10
    DOIs
    Publication statusPublished - 16 Feb 2009

    Keywords

    • EWI-15244
    • TST-uSPAM: micro Scanning Probe Array Memory
    • IR-62789
    • TST-SMI: Formerly in EWI-SMI
    • METIS-263792
    • TSTNE-Probe-MFM: Magnetic Force Microscope

    Cite this

    Brombacher, C., Saitner, M., Pfahler, C., Plettl, A., Ziemann, P., Makarov, D., ... Albrecht, M. (2009). Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media. Nanotechnology, 20(10), 105304-105308. [10.1088/0957-4484/20/10/105304]. https://doi.org/10.1088/0957-4484/20/10/105304