Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

C. Brombacher, M. Saitner, C. Pfahler, A. Plettl, P. Ziemann, D. Makarov, D. Assmann, Martin Herman Siekman, Leon Abelmann, M. Albrecht

Research output: Contribution to journalArticleAcademicpeer-review

18 Citations (Scopus)

Abstract

Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film–particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.
Original languageUndefined
Article number10.1088/0957-4484/20/10/105304
Pages (from-to)105304-105308
Number of pages6
JournalNanotechnology
Volume20
Issue number10
DOIs
Publication statusPublished - 16 Feb 2009

Keywords

  • EWI-15244
  • TST-uSPAM: micro Scanning Probe Array Memory
  • IR-62789
  • TST-SMI: Formerly in EWI-SMI
  • METIS-263792
  • TSTNE-Probe-MFM: Magnetic Force Microscope

Cite this

Brombacher, C., Saitner, M., Pfahler, C., Plettl, A., Ziemann, P., Makarov, D., ... Albrecht, M. (2009). Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media. Nanotechnology, 20(10), 105304-105308. [10.1088/0957-4484/20/10/105304]. https://doi.org/10.1088/0957-4484/20/10/105304
Brombacher, C. ; Saitner, M. ; Pfahler, C. ; Plettl, A. ; Ziemann, P. ; Makarov, D. ; Assmann, D. ; Siekman, Martin Herman ; Abelmann, Leon ; Albrecht, M. / Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media. In: Nanotechnology. 2009 ; Vol. 20, No. 10. pp. 105304-105308.
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abstract = "Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film–particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.",
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author = "C. Brombacher and M. Saitner and C. Pfahler and A. Plettl and P. Ziemann and D. Makarov and D. Assmann and Siekman, {Martin Herman} and Leon Abelmann and M. Albrecht",
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Brombacher, C, Saitner, M, Pfahler, C, Plettl, A, Ziemann, P, Makarov, D, Assmann, D, Siekman, MH, Abelmann, L & Albrecht, M 2009, 'Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media' Nanotechnology, vol. 20, no. 10, 10.1088/0957-4484/20/10/105304, pp. 105304-105308. https://doi.org/10.1088/0957-4484/20/10/105304

Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media. / Brombacher, C.; Saitner, M.; Pfahler, C.; Plettl, A.; Ziemann, P.; Makarov, D.; Assmann, D.; Siekman, Martin Herman; Abelmann, Leon; Albrecht, M.

In: Nanotechnology, Vol. 20, No. 10, 10.1088/0957-4484/20/10/105304, 16.02.2009, p. 105304-105308.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

AU - Brombacher, C.

AU - Saitner, M.

AU - Pfahler, C.

AU - Plettl, A.

AU - Ziemann, P.

AU - Makarov, D.

AU - Assmann, D.

AU - Siekman, Martin Herman

AU - Abelmann, Leon

AU - Albrecht, M.

N1 - 10.1088/0957-4484/20/10/105304

PY - 2009/2/16

Y1 - 2009/2/16

N2 - Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film–particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.

AB - Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film–particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.

KW - EWI-15244

KW - TST-uSPAM: micro Scanning Probe Array Memory

KW - IR-62789

KW - TST-SMI: Formerly in EWI-SMI

KW - METIS-263792

KW - TSTNE-Probe-MFM: Magnetic Force Microscope

U2 - 10.1088/0957-4484/20/10/105304

DO - 10.1088/0957-4484/20/10/105304

M3 - Article

VL - 20

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JF - Nanotechnology

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Brombacher C, Saitner M, Pfahler C, Plettl A, Ziemann P, Makarov D et al. Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media. Nanotechnology. 2009 Feb 16;20(10):105304-105308. 10.1088/0957-4484/20/10/105304. https://doi.org/10.1088/0957-4484/20/10/105304