Abstract
In this work we will review our recent work on novel alternative and disruptive technology concepts with industrial potential for cost-effective and high-speed interconnect manufacturing, in particular on the creation (drilling and filling) of advanced interconnects like TSVs. These technologies are 1) Spatially-divided Deep Reactive Ion Etching, S-DRIE, 2) Electrochemical Micromachining, ECM, and 3) Laser-Induced Forward Transfer, LIFT. The first technique will be reviewed in detail, the other two will only shortly be described.
Original language | English |
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Title of host publication | Proceedings of the 12th Annual PanPacific Microelectronics Symposium 2012 |
Place of Publication | Hawaii, USA |
Publisher | SMTA Pan Pacific |
Pages | 1-9 |
Publication status | Published - 14 Feb 2012 |
Event | 12th Annual PanPacific Microelectronics Symposium 2012: Proceedings of the 12th Annual PanPacific Microelectronics Symposium 2012 - Hawaii, USA Duration: 14 Feb 2012 → 16 Feb 2012 |
Conference
Conference | 12th Annual PanPacific Microelectronics Symposium 2012 |
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City | Hawaii, USA |
Period | 14/02/12 → 16/02/12 |