Abstract
In this work we will review our recent work on novel alternative and disruptive technology concepts with industrial potential for cost-effective and high-speed interconnect manufacturing, in particular on the creation (drilling and filling) of advanced interconnects like TSVs. These technologies are 1) Spatially-divided Deep Reactive Ion Etching, S-DRIE, 2) Electrochemical Micromachining, ECM, and 3) Laser-Induced Forward Transfer, LIFT. The first technique will be reviewed in detail, the other two will only shortly be described.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the 12th Annual PanPacific Microelectronics Symposium 2012 |
| Place of Publication | Hawaii, USA |
| Publisher | SMTA Pan Pacific |
| Pages | 1-9 |
| Publication status | Published - 14 Feb 2012 |
| Event | 12th Annual PanPacific Microelectronics Symposium 2012: Proceedings of the 12th Annual PanPacific Microelectronics Symposium 2012 - Hawaii, USA Duration: 14 Feb 2012 → 16 Feb 2012 |
Conference
| Conference | 12th Annual PanPacific Microelectronics Symposium 2012 |
|---|---|
| City | Hawaii, USA |
| Period | 14/02/12 → 16/02/12 |
Fingerprint
Dive into the research topics of 'Technology alternatives towards low-cost and high-speed interconnect manufacturing'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver