Templated Self-Assembly of Block Copolymers: Effect on Substrate Topography

Joy Y. Cheng; C.A. Ross; Edwin L. Thomas; Henry I. Smith; Gyula J. Vancso

doi:10.1002/adma.200305244

Templated Self-Assembly of Block Copolymers: Effect on Substrate Topography

Joy Y. Cheng, C.A. Ross, Edwin L. Thomas, Henry I. Smith, Gyula J. Vancso

Research output: Contribution to journal › Article › Academic › peer-review

211 Citations (Scopus)

Abstract

Topographical confinement is used to template the formation of nanoscale domains in a self-assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)

Original language	Undefined
Pages (from-to)	1599-1602
Number of pages	4
Journal	Advanced materials
Volume	15
Issue number	19
DOIs	https://doi.org/10.1002/adma.200305244
Publication status	Published - 2003

Keywords

Nanofabrication
METIS-214934
IR-71925
Block copolymers
Self-Assembly

Access to Document

10.1002/adma.200305244

Cite this

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title = "Templated Self-Assembly of Block Copolymers: Effect on Substrate Topography",

abstract = "Topographical confinement is used to template the formation of nanoscale domains in a self-assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)",

keywords = "Nanofabrication, METIS-214934, IR-71925, Block copolymers, Self-Assembly",

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AU - Vancso, Gyula J.

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KW - METIS-214934

KW - IR-71925

KW - Block copolymers

KW - Self-Assembly

U2 - 10.1002/adma.200305244

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