Abstract
Topographical confinement is used to template the formation of nanoscale domains in a self-assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)
Original language | Undefined |
---|---|
Pages (from-to) | 1599-1602 |
Number of pages | 4 |
Journal | Advanced materials |
Volume | 15 |
Issue number | 19 |
DOIs | |
Publication status | Published - 2003 |
Keywords
- Nanofabrication
- METIS-214934
- IR-71925
- Block copolymers
- Self-Assembly