Templated Self-Assembly of Block Copolymers: Effect on Substrate Topography

Joy Y. Cheng, C.A. Ross, Edwin L. Thomas, Henry I. Smith, Gyula J. Vancso

Research output: Contribution to journalArticleAcademicpeer-review

211 Citations (Scopus)

Abstract

Topographical confinement is used to template the formation of nanoscale domains in a self-assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)
Original languageUndefined
Pages (from-to)1599-1602
Number of pages4
JournalAdvanced materials
Volume15
Issue number19
DOIs
Publication statusPublished - 2003

Keywords

  • Nanofabrication
  • METIS-214934
  • IR-71925
  • Block copolymers
  • Self-Assembly

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