Templated Self-Assembly of Block Copolymers for Nanolithographic Applications

C.A. Ross; J.Y. Cheng; F. Llievsky; E.L. Thomas; H.I. Smith; G.J. Vancso

Templated Self-Assembly of Block Copolymers for Nanolithographic Applications

C.A. Ross, J.Y. Cheng, F. Llievsky, E.L. Thomas, H.I. Smith, G.J. Vancso

Materials Science and Technology of Polymers

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	230th ACS National Meeting 2005
Subtitle of host publication	August 28-September 1, 2005, Washington DC, USA
Place of Publication	Washington, DC
Publisher	American Chemical Society
Pages	574-575
Number of pages	2
Publication status	Published - 28 Aug 2005
Event	230th ACS National Meeting 2005 - Washington, United States Duration: 28 Aug 2005 → 1 Sept 2005 Conference number: 230

Publication series

Name	Polymer Preprints
Publisher	American Chemical Society
Volume	46
ISSN (Print)	0032-3934

Conference

Conference	230th ACS National Meeting 2005
Country/Territory	United States
City	Washington
Period	28/08/05 → 1/09/05

Keywords

METIS-229000

Cite this

@inproceedings{41b7e86e0ad14cf991469609566e28eb,

title = "Templated Self-Assembly of Block Copolymers for Nanolithographic Applications",

keywords = "METIS-229000",

author = "C.A. Ross and J.Y. Cheng and F. Llievsky and E.L. Thomas and H.I. Smith and G.J. Vancso",

year = "2005",

month = aug,

day = "28",

language = "English",

series = "Polymer Preprints",

publisher = "American Chemical Society",

pages = "574--575",

booktitle = "230th ACS National Meeting 2005",

address = "United States",

note = "230th ACS National Meeting 2005 ; Conference date: 28-08-2005 Through 01-09-2005",

}

Ross, CA, Cheng, JY, Llievsky, F, Thomas, EL, Smith, HI & Vancso, GJ 2005, Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. in 230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA. Polymer Preprints, vol. 46, American Chemical Society, Washington, DC, pp. 574-575, 230th ACS National Meeting 2005, Washington, District of Columbia, United States, 28/08/05.

Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. / Ross, C.A.; Cheng, J.Y.; Llievsky, F. et al.
230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA. Washington, DC: American Chemical Society, 2005. p. 574-575 (Polymer Preprints; Vol. 46).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Templated Self-Assembly of Block Copolymers for Nanolithographic Applications

AU - Ross, C.A.

AU - Cheng, J.Y.

AU - Llievsky, F.

AU - Thomas, E.L.

AU - Smith, H.I.

AU - Vancso, G.J.

N1 - Conference code: 230

PY - 2005/8/28

Y1 - 2005/8/28

KW - METIS-229000

M3 - Conference contribution

T3 - Polymer Preprints

SP - 574

EP - 575

BT - 230th ACS National Meeting 2005

PB - American Chemical Society

CY - Washington, DC

T2 - 230th ACS National Meeting 2005

Y2 - 28 August 2005 through 1 September 2005

ER -