Templated Self-Assembly of Block Copolymers for Nanolithographic Applications

C.A. Ross, J.Y. Cheng, F. Llievsky, E.L. Thomas, H.I. Smith, G.J. Vancso

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publication230th ACS National Meeting 2005
Subtitle of host publicationAugust 28-September 1, 2005, Washington DC, USA
Place of PublicationWashington, DC
PublisherAmerican Chemical Society
Pages574-575
Number of pages2
Publication statusPublished - 28 Aug 2005
Event230th ACS National Meeting 2005 - Washington, United States
Duration: 28 Aug 20051 Sep 2005
Conference number: 230

Publication series

NamePolymer Preprints
PublisherAmerican Chemical Society
Volume46
ISSN (Print)0032-3934

Conference

Conference230th ACS National Meeting 2005
CountryUnited States
CityWashington
Period28/08/051/09/05

Keywords

  • METIS-229000

Cite this

Ross, C. A., Cheng, J. Y., Llievsky, F., Thomas, E. L., Smith, H. I., & Vancso, G. J. (2005). Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. In 230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA (pp. 574-575). (Polymer Preprints; Vol. 46). Washington, DC: American Chemical Society.