Templated Self-Assembly of Block Copolymers for Nanolithographic Applications

C.A. Ross, J.Y. Cheng, F. Llievsky, E.L. Thomas, H.I. Smith, G.J. Vancso

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publication230th ACS National Meeting 2005
Subtitle of host publicationAugust 28-September 1, 2005, Washington DC, USA
Place of PublicationWashington, DC
PublisherAmerican Chemical Society
Pages574-575
Number of pages2
Publication statusPublished - 28 Aug 2005
Event230th ACS National Meeting 2005 - Washington, United States
Duration: 28 Aug 20051 Sep 2005
Conference number: 230

Publication series

NamePolymer Preprints
PublisherAmerican Chemical Society
Volume46
ISSN (Print)0032-3934

Conference

Conference230th ACS National Meeting 2005
CountryUnited States
CityWashington
Period28/08/051/09/05

Keywords

  • METIS-229000

Cite this

Ross, C. A., Cheng, J. Y., Llievsky, F., Thomas, E. L., Smith, H. I., & Vancso, G. J. (2005). Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. In 230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA (pp. 574-575). (Polymer Preprints; Vol. 46). Washington, DC: American Chemical Society.
Ross, C.A. ; Cheng, J.Y. ; Llievsky, F. ; Thomas, E.L. ; Smith, H.I. ; Vancso, G.J. / Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. 230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA. Washington, DC : American Chemical Society, 2005. pp. 574-575 (Polymer Preprints).
@inproceedings{41b7e86e0ad14cf991469609566e28eb,
title = "Templated Self-Assembly of Block Copolymers for Nanolithographic Applications",
keywords = "METIS-229000",
author = "C.A. Ross and J.Y. Cheng and F. Llievsky and E.L. Thomas and H.I. Smith and G.J. Vancso",
year = "2005",
month = "8",
day = "28",
language = "English",
series = "Polymer Preprints",
publisher = "American Chemical Society",
pages = "574--575",
booktitle = "230th ACS National Meeting 2005",
address = "United States",

}

Ross, CA, Cheng, JY, Llievsky, F, Thomas, EL, Smith, HI & Vancso, GJ 2005, Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. in 230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA. Polymer Preprints, vol. 46, American Chemical Society, Washington, DC, pp. 574-575, 230th ACS National Meeting 2005, Washington, United States, 28/08/05.

Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. / Ross, C.A.; Cheng, J.Y.; Llievsky, F.; Thomas, E.L.; Smith, H.I.; Vancso, G.J.

230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA. Washington, DC : American Chemical Society, 2005. p. 574-575 (Polymer Preprints; Vol. 46).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Templated Self-Assembly of Block Copolymers for Nanolithographic Applications

AU - Ross, C.A.

AU - Cheng, J.Y.

AU - Llievsky, F.

AU - Thomas, E.L.

AU - Smith, H.I.

AU - Vancso, G.J.

PY - 2005/8/28

Y1 - 2005/8/28

KW - METIS-229000

M3 - Conference contribution

T3 - Polymer Preprints

SP - 574

EP - 575

BT - 230th ACS National Meeting 2005

PB - American Chemical Society

CY - Washington, DC

ER -

Ross CA, Cheng JY, Llievsky F, Thomas EL, Smith HI, Vancso GJ. Templated Self-Assembly of Block Copolymers for Nanolithographic Applications. In 230th ACS National Meeting 2005: August 28-September 1, 2005, Washington DC, USA. Washington, DC: American Chemical Society. 2005. p. 574-575. (Polymer Preprints).