The black silicon method II: the effect of mask material and loading on the reactive ion etching of deep silicon trenches

  • Henricus V. Jansen
  • , Johannes Faas Burger
  • , Meint J. de Boer
  • , Rob Legtenberg
  • , Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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