The black silicon method II: the effect of mask material and loading on the reactive ion etching of deep silicon trenches

Henricus V. Jansen, Johannes Faas Burger, Meint J. de Boer, Rob Legtenberg, Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Fingerprint

Dive into the research topics of 'The black silicon method II: the effect of mask material and loading on the reactive ion etching of deep silicon trenches'. Together they form a unique fingerprint.

Physics

Material Science

Engineering