Abstract
The recently developed black silicon method (BSM) is presented as a powerful tool in finding recipes for the
fabrication of MEMS building blocks such as Ay-stages. scanning probe tips, inkjet filters, multi-electrodes for
neuro-electronic interfaces, and mouldings Lor direct patterning into polymers. The fabrication of these blocks in
silicon with high aspect ratios and smooth surface textures will be described and discussed by using the BSM and
standard reactive ion etching (ME).
Original language | English |
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Title of host publication | Micro Electro Mechanical Systems, 1995, MEMS '95, Proceedings. IEEE |
Place of Publication | Piscataway |
Publisher | IEEE Computer Society |
Pages | 88-93 |
Number of pages | 6 |
ISBN (Print) | 0-7803-2503-6 |
DOIs | |
Publication status | Published - 29 Jan 1995 |
Event | IEEE Workshop on Micro Electro Mechanical Systems, MEMS 1995 - Amsterdam, Netherlands Duration: 29 Jan 1995 → 2 Feb 1995 |
Workshop
Workshop | IEEE Workshop on Micro Electro Mechanical Systems, MEMS 1995 |
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Abbreviated title | MEMS |
Country/Territory | Netherlands |
City | Amsterdam |
Period | 29/01/95 → 2/02/95 |
Keywords
- EWI-13888
- METIS-114124
- IR-17229