The black silicon method. VIII: A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

Henri V. Jansen, Meint J. de Boer, Henk Wensink, Ben Kloeck, Miko Elwenspoek

    Research output: Contribution to journal › Article › Academic › peer-review

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