Abstract
Texture development as a function of film thickness (5-980 nm) was investigated for two series of Co/sub 81/Cr/sub 19/ films. In general, the films were strongly textured. The orientation ratio, OR/sub c/, was used to describe the strength of the texture. Experimental data showed that for the Series A films (5-200 nm), the OR/sub c/ value increased with increasing him thickness, while for Series B films (46-980 nm), the OR/sub c/ as a function of the film thickness described a single peak curve, with its maximum near 130 nm. The calculated local orientation ratios OR/sub cx/ for both the Series A and B films had maxima near 110 nm. The strain in Co-Cr films also changes with the film thickness. In the case of the Series B films, the strain along the film normal gradually changed from a tensile to a compressive strain with increasing film thickness, and near 130 nm the film was in a stress-free condition. It was also discovered that for Co-Cr films thinner than 46 nm, the aspect ratio of the grains approaches 1 and the typical columnar structure of grains is not observed, although (0002) fibre texture still exists.
Original language | English |
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Pages (from-to) | 1373-1379 |
Number of pages | 7 |
Journal | IEEE transactions on magnetics |
Volume | 30 |
DOIs | |
Publication status | Published - 1994 |
Keywords
- SMI-TST: From 2006 in EWI-TST
- SMI-MAT: MATERIALS
- Magnetic films
- Perpendicular magnetic recording
- Magnetic properties
- Capacitive sensors
- Tensile strain
- Chromium
- Sputtering
- Crystallization
- Crystal microstructure
- Disk recording