The effect of thermal annealing on the adherence of alumina films deposited by low pressure MOCVD on several high alloyed steels

V.A.C. Haanappel, A.H.J. van den Berg, H.D. van Corbach, T. Fransen, P.J. Gellings

Research output: Contribution to journalArticleAcademicpeer-review

Original languageUndefined
Pages (from-to)-
JournalJournal of adhesion science and technology
Publication statusPublished - 1995

Keywords

  • METIS-128921

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