The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

V.A.C. Haanappel, V.A.C. Haanappel, D. van de Vendel, H.D. van Corbach, T. Fransen, P.J. Gellings

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Abstract

Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.
Original languageUndefined
Pages (from-to)8-12
Number of pages5
JournalThin solid films
Volume256
Issue number1-2
DOIs
Publication statusPublished - 1995

Keywords

  • IR-10062
  • METIS-105475

Cite this

Haanappel, V. A. C., Haanappel, V. A. C., van de Vendel, D., van Corbach, H. D., Fransen, T., & Gellings, P. J. (1995). The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD. Thin solid films, 256(1-2), 8-12. https://doi.org/10.1016/0040-6090(95)80026-3