The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

V.A.C. Haanappel, D. van de Vendel, H.D. van Corbach, T. Fransen, P.J. Gellings

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Abstract

Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.
Original languageEnglish
Pages (from-to)8-12
Number of pages5
JournalThin solid films
Volume256
Issue number1-2
DOIs
Publication statusPublished - 1995

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