The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

V.A.C. Haanappel; D. van de Vendel; H.D. van Corbach; T. Fransen; P.J. Gellings

doi:10.1016/0040-6090(95)80026-3

The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

V.A.C. Haanappel, D. van de Vendel, H.D. van Corbach, T. Fransen, P.J. Gellings

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Abstract

Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.

Original language	English
Pages (from-to)	8-12
Number of pages	5
Journal	Thin solid films
Volume	256
Issue number	1-2
DOIs	https://doi.org/10.1016/0040-6090(95)80026-3
Publication status	Published - 1995

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@article{6a506b4ebcfc4f968e6ef3b1efcc0535,

title = "The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD",

abstract = "Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.",

author = "V.A.C. Haanappel and {van de Vendel}, D. and {van Corbach}, H.D. and T. Fransen and P.J. Gellings",

year = "1995",

doi = "10.1016/0040-6090(95)80026-3",

language = "English",

volume = "256",

pages = "8--12",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

AU - Haanappel, V.A.C.

AU - van de Vendel, D.

AU - van Corbach, H.D.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1995

Y1 - 1995

N2 - Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.

AB - Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated. Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.

U2 - 10.1016/0040-6090(95)80026-3

DO - 10.1016/0040-6090(95)80026-3

M3 - Article

SN - 0040-6090

VL - 256

SP - 8

EP - 12

JO - Thin solid films

JF - Thin solid films

IS - 1-2

ER -

The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

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