The effects of metallic underlayers on magnetic properties of obliquely sputtered Co thin films

L.T. Nguyen; A. Lisfi; J.C. Lodder

doi:10.1016/S0304-8853(01)01163-5

The effects of metallic underlayers on magnetic properties of obliquely sputtered Co thin films

L.T. Nguyen, A. Lisfi, J.C. Lodder

Research output: Contribution to journal › Article › Academic › peer-review

11 Citations (Scopus)

Abstract

By using oblique sputtering, Co films have been grown on polymer substrate (PET) with and without metallic underlayers such as Cu and Al. The microstructure and magnetic properties have been investigated at large as well as intermediate incident angle of deposition.It was confirmed that the underlayer induces a significant change in microstructure by isolating the nuclei and reducing their sizes. Consequently, the magnetic properties are strongly affected due to the low magnetocrystalline anisotropy (face-centered-cubic Co). Other analyses (deltaM, MFM) support these observations.

Original language	Undefined
Pages (from-to)	374-377
Number of pages	4
Journal	Journal of magnetism and magnetic materials
Volume	242-245
Issue number	Part 1
DOIs	https://doi.org/10.1016/S0304-8853(01)01163-5
Publication status	Published - 2002

Keywords

IR-63020
EWI-5605
SMI-MAT: MATERIALS
SMI-TST: From 2006 in EWI-TST
METIS-208300

Access to Document

10.1016/S0304-8853(01)01163-5

http://eprints.eemcs.utwente.nl/secure2/5605/01/NGUYEN2002.PDF

Cite this

@article{8323f15b6a8e4a9daf656c64df46e27b,

title = "The effects of metallic underlayers on magnetic properties of obliquely sputtered Co thin films",

abstract = "By using oblique sputtering, Co films have been grown on polymer substrate (PET) with and without metallic underlayers such as Cu and Al. The microstructure and magnetic properties have been investigated at large as well as intermediate incident angle of deposition.It was confirmed that the underlayer induces a significant change in microstructure by isolating the nuclei and reducing their sizes. Consequently, the magnetic properties are strongly affected due to the low magnetocrystalline anisotropy (face-centered-cubic Co). Other analyses (deltaM, MFM) support these observations.",

keywords = "IR-63020, EWI-5605, SMI-MAT: MATERIALS, SMI-TST: From 2006 in EWI-TST, METIS-208300",

author = "L.T. Nguyen and A. Lisfi and J.C. Lodder",

note = "Imported from SMI Reference manager",

year = "2002",

doi = "10.1016/S0304-8853(01)01163-5",

language = "Undefined",

volume = "242-245",

pages = "374--377",

journal = "Journal of magnetism and magnetic materials",

issn = "0304-8853",

publisher = "Elsevier",

number = "Part 1",

}

TY - JOUR

T1 - The effects of metallic underlayers on magnetic properties of obliquely sputtered Co thin films

AU - Nguyen, L.T.

AU - Lisfi, A.

AU - Lodder, J.C.

N1 - Imported from SMI Reference manager

PY - 2002

Y1 - 2002

N2 - By using oblique sputtering, Co films have been grown on polymer substrate (PET) with and without metallic underlayers such as Cu and Al. The microstructure and magnetic properties have been investigated at large as well as intermediate incident angle of deposition.It was confirmed that the underlayer induces a significant change in microstructure by isolating the nuclei and reducing their sizes. Consequently, the magnetic properties are strongly affected due to the low magnetocrystalline anisotropy (face-centered-cubic Co). Other analyses (deltaM, MFM) support these observations.

AB - By using oblique sputtering, Co films have been grown on polymer substrate (PET) with and without metallic underlayers such as Cu and Al. The microstructure and magnetic properties have been investigated at large as well as intermediate incident angle of deposition.It was confirmed that the underlayer induces a significant change in microstructure by isolating the nuclei and reducing their sizes. Consequently, the magnetic properties are strongly affected due to the low magnetocrystalline anisotropy (face-centered-cubic Co). Other analyses (deltaM, MFM) support these observations.

KW - IR-63020

KW - EWI-5605

KW - SMI-MAT: MATERIALS

KW - SMI-TST: From 2006 in EWI-TST

KW - METIS-208300

U2 - 10.1016/S0304-8853(01)01163-5

DO - 10.1016/S0304-8853(01)01163-5

M3 - Article

VL - 242-245

SP - 374

EP - 377

JO - Journal of magnetism and magnetic materials

JF - Journal of magnetism and magnetic materials

SN - 0304-8853

IS - Part 1

ER -