TY - JOUR
T1 - The erosion of amorphous and crystalline surfaces by ion bombardment
AU - Smith, R.
AU - Valkering, T.P.
AU - Walls, J.M.
PY - 1981
Y1 - 1981
N2 - Ion etching is a commercially important technique used in the micromachining of solid surfaces. In this paper the three-dimensional theory of the development of surface topography during ion bombardment is extended to include the effects of surface crystallinity. The method of characteristics is used to trace the development of edges and facets that develop on three-dimensional surfaces due to multiple stationary points present in the angular dependence of the sputtering yield. The analytical approach used facilitates subsequent numerical calculations and examples are given to illustrate the applications of the theory to both amorphous and crystalline structures.
AB - Ion etching is a commercially important technique used in the micromachining of solid surfaces. In this paper the three-dimensional theory of the development of surface topography during ion bombardment is extended to include the effects of surface crystallinity. The method of characteristics is used to trace the development of edges and facets that develop on three-dimensional surfaces due to multiple stationary points present in the angular dependence of the sputtering yield. The analytical approach used facilitates subsequent numerical calculations and examples are given to illustrate the applications of the theory to both amorphous and crystalline structures.
UR - http://www.scopus.com/inward/record.url?scp=0019624647&partnerID=8YFLogxK
U2 - 10.1080/01418618108239555
DO - 10.1080/01418618108239555
M3 - Article
AN - SCOPUS:0019624647
SN - 0141-8610
VL - 44
SP - 879
EP - 893
JO - Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
JF - Philosophical Magazine A: Physics of Condensed Matter, Structure, Defects and Mechanical Properties
IS - 4
ER -
