The form of etch rate minima in wet chemical anisotropic etching of silicon

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined
Pages (from-to)	405-409
Journal	Journal of micromechanics and microengineering
Issue number	6
Publication status	Published - 1997

Keywords

@article{351f4f56ef4d414881eae344163f6488,

title = "The form of etch rate minima in wet chemical anisotropic etching of silicon",

keywords = "METIS-111513",

author = "Elwenspoek, \{Michael Curt\}",

year = "1997",

language = "Undefined",

pages = "405--409",

journal = "Journal of micromechanics and microengineering",

issn = "0960-1317",

publisher = "Institute of Physics (IOP)",

number = "6",

}