Abstract
This paper describes a curved-layer additive manufacturing technology that has the potential to print plastic components with integral conductive polymer electronic circuits. Researchers at AUT University in New Zealand and the National University of Singapore have developed a novel Fused Deposition Modeling (FDM) process in which the layers of material that make up the part are deposited as curved layers instead of the conventional flat layers. This technology opens up possibilities of building curved plastic parts that have conductive electronic tracks and components printed as an integral part of the plastic component, thereby eliminating printed circuit boards and wiring. It is not possible to do this with existing flat-layer additive manufacturing technologies as the continuity of a circuit could be interrupted between the layers. With curved-layer fused deposition modeling (CLFDM) this problem is removed as continuous filaments in 3 dimensions can be produced, allowing for continuous conductive circuits.
| Original language | English |
|---|---|
| Title of host publication | Innovative Developments in Design and Manufacturing - Advanced Research in Virtual and Rapid Prototyping |
| Pages | 397-403 |
| Number of pages | 7 |
| Publication status | Published - 2010 |
| Externally published | Yes |
| Event | 4th International Conference on Advanced Research in Virtual and Physical Prototyping, VRAP 2009 - Leiria, Portugal Duration: 6 Oct 2009 → 10 Oct 2009 Conference number: 4 |
Conference
| Conference | 4th International Conference on Advanced Research in Virtual and Physical Prototyping, VRAP 2009 |
|---|---|
| Abbreviated title | VRAP 2009 |
| Country/Territory | Portugal |
| City | Leiria |
| Period | 6/10/09 → 10/10/09 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
-
SDG 9 Industry, Innovation, and Infrastructure
Fingerprint
Dive into the research topics of 'The future of electronic products: Conductive 3D printing?'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver