The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth

N.J.C. Ingle, R.H. Hammond, M.R. Beasley, David H.A. Blank

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The growth of many epitaxial thin-film oxides is significantly enhanced with the use of an oxidizing agent such as atomic oxygen, ozone, or NO2. We developed a flow-through microwave plasma source to generate large atomic oxygen fluxes while maintaining vacuum pressures of less that 1×10¿4 Torr. Continuous and real-time detection of the atomic oxygen was achieved by atomic absorption of the 130 nm atomic oxygen lines. Atomic oxygen fluxes of at least 1.4×1018 atoms/cm2 s and dissociation efficiencies of around 100% were obtained
Original languageUndefined
Pages (from-to)4162-4164
Number of pages3
JournalApplied physics letters
Issue number26
Publication statusPublished - 1999


  • METIS-128770
  • IR-23971

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