The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth

N.J.C. Ingle, R.H. Hammond, M.R. Beasley, David H.A. Blank

Research output: Contribution to journalArticleAcademicpeer-review

22 Citations (Scopus)

Abstract

The growth of many epitaxial thin-film oxides is significantly enhanced with the use of an oxidizing agent such as atomic oxygen, ozone, or NO2. We developed a flow-through microwave plasma source to generate large atomic oxygen fluxes while maintaining vacuum pressures of less that 1×10¿4 Torr. Continuous and real-time detection of the atomic oxygen was achieved by atomic absorption of the 130 nm atomic oxygen lines. Atomic oxygen fluxes of at least 1.4×1018 atoms/cm2 s and dissociation efficiencies of around 100% were obtained
Original languageUndefined
Pages (from-to)4162-4164
Number of pages3
JournalApplied physics letters
Volume75
Issue number26
DOIs
Publication statusPublished - 1999

Keywords

  • METIS-128770
  • IR-23971

Cite this

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abstract = "The growth of many epitaxial thin-film oxides is significantly enhanced with the use of an oxidizing agent such as atomic oxygen, ozone, or NO2. We developed a flow-through microwave plasma source to generate large atomic oxygen fluxes while maintaining vacuum pressures of less that 1×10¿4 Torr. Continuous and real-time detection of the atomic oxygen was achieved by atomic absorption of the 130 nm atomic oxygen lines. Atomic oxygen fluxes of at least 1.4×1018 atoms/cm2 s and dissociation efficiencies of around 100{\%} were obtained",
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author = "N.J.C. Ingle and R.H. Hammond and M.R. Beasley and Blank, {David H.A.}",
year = "1999",
doi = "10.1063/1.125569",
language = "Undefined",
volume = "75",
pages = "4162--4164",
journal = "Applied physics letters",
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publisher = "American Institute of Physics",
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The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth. / Ingle, N.J.C.; Hammond, R.H.; Beasley, M.R.; Blank, David H.A.

In: Applied physics letters, Vol. 75, No. 26, 1999, p. 4162-4164.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth

AU - Ingle, N.J.C.

AU - Hammond, R.H.

AU - Beasley, M.R.

AU - Blank, David H.A.

PY - 1999

Y1 - 1999

N2 - The growth of many epitaxial thin-film oxides is significantly enhanced with the use of an oxidizing agent such as atomic oxygen, ozone, or NO2. We developed a flow-through microwave plasma source to generate large atomic oxygen fluxes while maintaining vacuum pressures of less that 1×10¿4 Torr. Continuous and real-time detection of the atomic oxygen was achieved by atomic absorption of the 130 nm atomic oxygen lines. Atomic oxygen fluxes of at least 1.4×1018 atoms/cm2 s and dissociation efficiencies of around 100% were obtained

AB - The growth of many epitaxial thin-film oxides is significantly enhanced with the use of an oxidizing agent such as atomic oxygen, ozone, or NO2. We developed a flow-through microwave plasma source to generate large atomic oxygen fluxes while maintaining vacuum pressures of less that 1×10¿4 Torr. Continuous and real-time detection of the atomic oxygen was achieved by atomic absorption of the 130 nm atomic oxygen lines. Atomic oxygen fluxes of at least 1.4×1018 atoms/cm2 s and dissociation efficiencies of around 100% were obtained

KW - METIS-128770

KW - IR-23971

U2 - 10.1063/1.125569

DO - 10.1063/1.125569

M3 - Article

VL - 75

SP - 4162

EP - 4164

JO - Applied physics letters

JF - Applied physics letters

SN - 0003-6951

IS - 26

ER -