The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors

V.E. Houtsma, J. Holleman, P.H. Woerlee, A.J. Hof

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the SAFE'98
    Place of PublicationMierlo, the Netherlands
    Number of pages4
    Publication statusPublished - 25 Nov 1998


    • METIS-113846

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