The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors

V.E. Houtsma, J. Holleman, P.H. Woerlee, A.J. Hof

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the SAFE'98
    Place of PublicationMierlo, the Netherlands
    Pages221-224
    Number of pages4
    Publication statusPublished - 25 Nov 1998

    Keywords

    • METIS-113846

    Cite this

    Houtsma, V. E., Holleman, J., Woerlee, P. H., & Hof, A. J. (1998). The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors. In Proceedings of the SAFE'98 (pp. 221-224). Mierlo, the Netherlands.
    Houtsma, V.E. ; Holleman, J. ; Woerlee, P.H. ; Hof, A.J. / The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors. Proceedings of the SAFE'98. Mierlo, the Netherlands, 1998. pp. 221-224
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    title = "The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors",
    keywords = "METIS-113846",
    author = "V.E. Houtsma and J. Holleman and P.H. Woerlee and A.J. Hof",
    year = "1998",
    month = "11",
    day = "25",
    language = "Undefined",
    isbn = "90-73461-15-4",
    pages = "221--224",
    booktitle = "Proceedings of the SAFE'98",

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    Houtsma, VE, Holleman, J, Woerlee, PH & Hof, AJ 1998, The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors. in Proceedings of the SAFE'98. Mierlo, the Netherlands, pp. 221-224.

    The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors. / Houtsma, V.E.; Holleman, J.; Woerlee, P.H.; Hof, A.J.

    Proceedings of the SAFE'98. Mierlo, the Netherlands, 1998. p. 221-224.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    TY - GEN

    T1 - The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors

    AU - Houtsma, V.E.

    AU - Holleman, J.

    AU - Woerlee, P.H.

    AU - Hof, A.J.

    PY - 1998/11/25

    Y1 - 1998/11/25

    KW - METIS-113846

    M3 - Conference contribution

    SN - 90-73461-15-4

    SP - 221

    EP - 224

    BT - Proceedings of the SAFE'98

    CY - Mierlo, the Netherlands

    ER -

    Houtsma VE, Holleman J, Woerlee PH, Hof AJ. The Influence of Fluorine on the Stress-Induced Leakage Current Characteristics in n+ Poly-Si MOS Capacitors. In Proceedings of the SAFE'98. Mierlo, the Netherlands. 1998. p. 221-224