InGrid, the technology used to make CMOS-integrated high voltage electrodes for micropattern gaseous detectors is reviewed in this paper. It is presented in the broader context of CMOS wafer post-processing. This processing platform is briefly described, and recent highlights of this manufacturing approach are brought forward. The InGrid technology facilitates research into radiation imaging detectors with fully integrated electronics.
|Journal||Proceedings of Science|
|Publication status||Published - 1 Jan 2009|
|Event||18th Workshop on Vertex Detectors and Related Techniques, VERTEX 2009 - Veluwe, Netherlands|
Duration: 13 Sep 2009 → 18 Sep 2009
Conference number: 18th