The Modeling of Electromigration: A New Challenge for TCAD

W. Schoenmaker, V. Petrescu

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of The Impact of Deep Submicron Structures on TCAD Developments
    Place of PublicationLeuven, Belgium
    Number of pages18
    Publication statusPublished - 15 Dec 1998


    • METIS-113878

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