The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion

V.A.C. Haanappel, H.D. van Corbach, T. Fransen, P.J. Gellings

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageUndefined
Title of host publication183rd meeting The Electrochemical Society, Inc.
Place of PublicationHonolulu, Hawaii
Pages-
Number of pages12
Publication statusPublished - 16 May 1993

Keywords

  • METIS-107520

Cite this

Haanappel, V. A. C., van Corbach, H. D., Fransen, T., & Gellings, P. J. (1993). The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion. In 183rd meeting The Electrochemical Society, Inc. (pp. -). Honolulu, Hawaii.
Haanappel, V.A.C. ; van Corbach, H.D. ; Fransen, T. ; Gellings, P.J. / The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion. 183rd meeting The Electrochemical Society, Inc.. Honolulu, Hawaii, 1993. pp. -
@inproceedings{68cd8bc44ad844d6964dd8c14a9e6cd8,
title = "The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion",
keywords = "METIS-107520",
author = "V.A.C. Haanappel and {van Corbach}, H.D. and T. Fransen and P.J. Gellings",
year = "1993",
month = "5",
day = "16",
language = "Undefined",
pages = "--",
booktitle = "183rd meeting The Electrochemical Society, Inc.",

}

Haanappel, VAC, van Corbach, HD, Fransen, T & Gellings, PJ 1993, The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion. in 183rd meeting The Electrochemical Society, Inc.. Honolulu, Hawaii, pp. -.

The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion. / Haanappel, V.A.C.; van Corbach, H.D.; Fransen, T.; Gellings, P.J.

183rd meeting The Electrochemical Society, Inc.. Honolulu, Hawaii, 1993. p. -.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion

AU - Haanappel, V.A.C.

AU - van Corbach, H.D.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1993/5/16

Y1 - 1993/5/16

KW - METIS-107520

M3 - Conference contribution

SP - -

BT - 183rd meeting The Electrochemical Society, Inc.

CY - Honolulu, Hawaii

ER -

Haanappel VAC, van Corbach HD, Fransen T, Gellings PJ. The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion. In 183rd meeting The Electrochemical Society, Inc.. Honolulu, Hawaii. 1993. p. -