The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion

V.A.C. Haanappel, H.D. van Corbach, T. Fransen, P.J. Gellings

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	183rd meeting The Electrochemical Society, Inc.
Place of Publication	Honolulu, Hawaii
Pages	-
Number of pages	12
Publication status	Published - 16 May 1993

Keywords

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title = "The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion",

keywords = "METIS-107520",

author = "V.A.C. Haanappel and {van Corbach}, H.D. and T. Fransen and P.J. Gellings",

year = "1993",

month = may,

day = "16",

language = "Undefined",

pages = "--",

booktitle = "183rd meeting The Electrochemical Society, Inc.",

}

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion

AU - Haanappel, V.A.C.

AU - van Corbach, H.D.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1993/5/16

Y1 - 1993/5/16

KW - METIS-107520

M3 - Conference contribution

SP - -

BT - 183rd meeting The Electrochemical Society, Inc.

CY - Honolulu, Hawaii

ER -