The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion

V.A.C. Haanappel, H.D. van Corbach, T. Fransen, P.J. Gellings

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageUndefined
Title of host publication183rd meeting The Electrochemical Society, Inc.
Place of PublicationHonolulu, Hawaii
Pages-
Number of pages12
Publication statusPublished - 16 May 1993

Keywords

  • METIS-107520

Cite this

Haanappel, V. A. C., van Corbach, H. D., Fransen, T., & Gellings, P. J. (1993). The production of metal organic chemical vapour deposited (MOVCD) thin alumina films against high temperature corrosion. In 183rd meeting The Electrochemical Society, Inc. (pp. -). Honolulu, Hawaii.