The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films

R. Hofman, J.G.F. Westheim, V.A.C. Haanappel, T. Fransen, P.J. Gellings

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Abstract

In this study the effects of the nature of metal alkoxides on their vapour pressures and thermal decomposition chemistry are reported. The vapour pressure and the volatility of a metal alkoxide strongly depends on the steric effect of its alkoxy group. The thermal decomposition chemistry of one metal alkoxide (di-acetoxy-di-t-butoxy-silane, DADBS) has been studied by mass spectrometry at temperatures between 423 and 923 K. The pyrolytic products were acetic acid anhydride and 2-methyl propene. The acetic acid anhydride is formed at temperatures above 473 K and 2-methyl propene is formed above 673 K by a ß -hydride elimination mechanism. In these steps, a 6-ring intermediate is supposed to be formed. The silicon acid finally remaining is proposed to react by poly-condensation to SiO2 coatings or powder.
Original languageEnglish
Pages (from-to)329-335
Number of pages7
JournalTheoretica chimica acta
Volume215
DOIs
Publication statusPublished - 1993

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