The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films

R. Hofman; J.G.F. Westheim; V.A.C. Haanappel; T. Fransen; P.J. Gellings

doi:10.1016/0040-6031(93)80109-N

The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films

R. Hofman, J.G.F. Westheim, V.A.C. Haanappel, T. Fransen, P.J. Gellings

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Abstract

In this study the effects of the nature of metal alkoxides on their vapour pressures and thermal decomposition chemistry are reported. The vapour pressure and the volatility of a metal alkoxide strongly depends on the steric effect of its alkoxy group. The thermal decomposition chemistry of one metal alkoxide (di-acetoxy-di-t-butoxy-silane, DADBS) has been studied by mass spectrometry at temperatures between 423 and 923 K. The pyrolytic products were acetic acid anhydride and 2-methyl propene. The acetic acid anhydride is formed at temperatures above 473 K and 2-methyl propene is formed above 673 K by a ß -hydride elimination mechanism. In these steps, a 6-ring intermediate is supposed to be formed. The silicon acid finally remaining is proposed to react by poly-condensation to SiO2 coatings or powder.

Original language	English
Pages (from-to)	329-335
Number of pages	7
Journal	Theoretica chimica acta
Volume	215
DOIs	https://doi.org/10.1016/0040-6031(93)80109-N
Publication status	Published - 1993

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title = "The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films",

abstract = "In this study the effects of the nature of metal alkoxides on their vapour pressures and thermal decomposition chemistry are reported. The vapour pressure and the volatility of a metal alkoxide strongly depends on the steric effect of its alkoxy group. The thermal decomposition chemistry of one metal alkoxide (di-acetoxy-di-t-butoxy-silane, DADBS) has been studied by mass spectrometry at temperatures between 423 and 923 K. The pyrolytic products were acetic acid anhydride and 2-methyl propene. The acetic acid anhydride is formed at temperatures above 473 K and 2-methyl propene is formed above 673 K by a {\ss} -hydride elimination mechanism. In these steps, a 6-ring intermediate is supposed to be formed. The silicon acid finally remaining is proposed to react by poly-condensation to SiO2 coatings or powder.",

author = "R. Hofman and J.G.F. Westheim and V.A.C. Haanappel and T. Fransen and P.J. Gellings",

year = "1993",

doi = "10.1016/0040-6031(93)80109-N",

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journal = "Theoretica chimica acta",

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T1 - The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films

AU - Hofman, R.

AU - Westheim, J.G.F.

AU - Haanappel, V.A.C.

AU - Fransen, T.

AU - Gellings, P.J.

PY - 1993

Y1 - 1993

N2 - In this study the effects of the nature of metal alkoxides on their vapour pressures and thermal decomposition chemistry are reported. The vapour pressure and the volatility of a metal alkoxide strongly depends on the steric effect of its alkoxy group. The thermal decomposition chemistry of one metal alkoxide (di-acetoxy-di-t-butoxy-silane, DADBS) has been studied by mass spectrometry at temperatures between 423 and 923 K. The pyrolytic products were acetic acid anhydride and 2-methyl propene. The acetic acid anhydride is formed at temperatures above 473 K and 2-methyl propene is formed above 673 K by a ß -hydride elimination mechanism. In these steps, a 6-ring intermediate is supposed to be formed. The silicon acid finally remaining is proposed to react by poly-condensation to SiO2 coatings or powder.

AB - In this study the effects of the nature of metal alkoxides on their vapour pressures and thermal decomposition chemistry are reported. The vapour pressure and the volatility of a metal alkoxide strongly depends on the steric effect of its alkoxy group. The thermal decomposition chemistry of one metal alkoxide (di-acetoxy-di-t-butoxy-silane, DADBS) has been studied by mass spectrometry at temperatures between 423 and 923 K. The pyrolytic products were acetic acid anhydride and 2-methyl propene. The acetic acid anhydride is formed at temperatures above 473 K and 2-methyl propene is formed above 673 K by a ß -hydride elimination mechanism. In these steps, a 6-ring intermediate is supposed to be formed. The silicon acid finally remaining is proposed to react by poly-condensation to SiO2 coatings or powder.

U2 - 10.1016/0040-6031(93)80109-N

DO - 10.1016/0040-6031(93)80109-N

M3 - Article

SN - 0040-5744

VL - 215

SP - 329

EP - 335

JO - Theoretica chimica acta

JF - Theoretica chimica acta

ER -

The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films

Abstract

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