The resistance towards gas transport of a sublayer of asymmetric PPO hollow fiber membranes determined by plasma-etching

C.J.M. Bauer, J. Smid, J. Olijslager, C.A. Smolders, C.A. Smolders

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Abstract

Plasma-etching is a powerful tool in the determination of the resistance of the sublayer of skinned asymmetric hollow fiber membranes of poly (2,6-dimethyl-l,4-phenylene oxide). Using a resistance model and data provided by etched hollow PPO fiber membranes it is possible to predict the ultimate selectivity of the total membrane for helium over nitrogen and oxygen over nitrogen. From this model and from permeability measurements it is shown that the gas resistance of the sublayer of asymmetric membranes with a selective layer has a large effect on the ultimate overall selectivity of the membranes. In order to improve the membrane performance the resistance of the sublayer has to be minimized. Etching experiments were performed on follow fiber membranes spun from PPO-types with different intrinsic viscosities. The resistance of the sublayer decreased markedly with increasing intrinsic viscosity of the PPO. To a lesser extent the membrane preparation (the length of the air gap) influences the gas resistance of the sublayer.
Original languageEnglish
Pages (from-to)307-320
Number of pages14
JournalJournal of membrane science
Volume57
Issue number2-3
DOIs
Publication statusPublished - 1991

Keywords

  • METIS-105609
  • IR-72929
  • Membrane preparation and structure
  • Gas separations
  • 4-phenylene oxide)
  • 6-dimethyl-1
  • Plasma Etching
  • Poly(2
  • gas and vapor permeation
  • Hollow fiber membranes

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