The RF Charge Pump Technique for Measuring the Interface State Density on Leaky Dielectrics

G.T. Sasse; Hendrikus de Vries; Jurriaan Schmitz

The RF Charge Pump Technique for Measuring the Interface State Density on Leaky Dielectrics

G.T. Sasse
, Hendrikus de Vries
, Jurriaan Schmitz

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	Undefined
Title of host publication	8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005
Place of Publication	Veldhoven, The Netherlands
Publisher	STW
Pages	47-51
Number of pages	5
ISBN (Print)	90-73461-50-2
Publication status	Published - 17 Nov 2005
Event	8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005 - Veldhoven, Netherlands Duration: 17 Nov 2005 → 18 Nov 2005 Conference number: 8

Workshop

Workshop	8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005
Abbreviated title	SAFE
Country/Territory	Netherlands
City	Veldhoven
Period	17/11/05 → 18/11/05

Keywords

METIS-225620

Cite this

@inproceedings{df2bd851dade40df85334ae6d9ca1cd4,

title = "The RF Charge Pump Technique for Measuring the Interface State Density on Leaky Dielectrics",

keywords = "METIS-225620",

author = "G.T. Sasse and \{de Vries\}, Hendrikus and Jurriaan Schmitz",

year = "2005",

month = nov,

day = "17",

language = "Undefined",

isbn = "90-73461-50-2",

pages = "47--51",

booktitle = "8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005",

publisher = "STW",

note = "8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005 ; Conference date: 17-11-2005 Through 18-11-2005",

}

Sasse, GT, de Vries, H & Schmitz, J 2005, The RF Charge Pump Technique for Measuring the Interface State Density on Leaky Dielectrics. in 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005. STW, Veldhoven, The Netherlands, pp. 47-51, 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005, Veldhoven, Netherlands, 17/11/05.

The RF Charge Pump Technique for Measuring the Interface State Density on Leaky Dielectrics. / Sasse, G.T.; de Vries, Hendrikus; Schmitz, Jurriaan.
8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005. Veldhoven, The Netherlands: STW, 2005. p. 47-51.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - The RF Charge Pump Technique for Measuring the Interface State Density on Leaky Dielectrics

AU - Sasse, G.T.

AU - de Vries, Hendrikus

AU - Schmitz, Jurriaan

N1 - Conference code: 8

PY - 2005/11/17

Y1 - 2005/11/17

KW - METIS-225620

M3 - Conference contribution

SN - 90-73461-50-2

SP - 47

EP - 51

BT - 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005

PB - STW

CY - Veldhoven, The Netherlands

T2 - 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005

Y2 - 17 November 2005 through 18 November 2005

ER -