@misc{6c494f78c1c34291b114f2a40f0ee41b,
title = "Thermal damage in Mo/Si based multilayers for short-wavelength FELs",
keywords = "METIS-304972",
author = "Andrey Yakshin and \{Van de Kruis\}, R.W.E. and R. Sobierajski and Eric Louis and S. Bruijn and R.A. Loch and Frederik Bijkerk",
note = "Award for Encouragement of Research in Thin Films to Andrey Yakshin: At the 15th triennial conference on Thin Films (ICTF15) held in Kyoto, last November, Andrey Yakshin has won an award on a relatively new application of multilayer optics. Yakshin presented results on the use of multilayer optics for the next 'grand challenge' for such optics after the successful usage in Extreme UV lithography. This new field concerns Free Electron Lasers in the XUV wavelength range: multilayer structures can enable new experimental schemes and FEL beamlines once their robustness has been demonstrated convincingly. The results of the work show that there is a safe application range found, with the basic degrading layer diffusion processes now being largely understood. This opens up the way towards new improvements of the multilayer material compositions so that full usage at FEL becomes possible. ",
year = "2011",
language = "English",
type = "Other",
}