Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers

M.J.M.E. de Nivelle; B.W.O. Hauser; Enrico G. Keim; Horst Rogalla

doi:10.1007/978-1-4613-9880-6_60

Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers

M.J.M.E. de Nivelle
, B.W.O. Hauser
, Enrico G. Keim
, Horst Rogalla

Physics of Interfaces and Nanomaterials

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K.

Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.

Original language	English
Title of host publication	Advances in Cryogenic Engineering Materials
Subtitle of host publication	Proceedings of the Eighth International Cryogenic Materials Conference (ICMC) held July 24-28, 1989, at UCLA, in Los Angeles, California
Editors	R.P. Reed, F.R. Fickett
Place of Publication	New York, NY
Publisher	Springer
Pages	467-471
Number of pages	5
ISBN (Electronic)	978-1-4613-9880-6
ISBN (Print)	978-0-306-43598-0, 978-1-4613-9882-0
DOIs	https://doi.org/10.1007/978-1-4613-9880-6_60
Publication status	Published - 1990
Event	1989 Cryogenic Engineering Conference & International Cryogenic Materials Conference, CEC/ICMC 1989 - UCLA, Los Angeles, United States Duration: 24 Jul 1989 → 28 Jul 1989

Publication series

Name	Advances in cryogenic engineering
Publisher	Springer
Volume	36, Part A
ISSN (Print)	0065-2482

Conference

Conference	1989 Cryogenic Engineering Conference & International Cryogenic Materials Conference, CEC/ICMC 1989
Abbreviated title	CEC/ICMC
Country/Territory	United States
City	Los Angeles
Period	24/07/89 → 28/07/89

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10.1007/978-1-4613-9880-6_60

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de Nivelle, M. J. M. E., Hauser, B. W. O., Keim, E. G., & Rogalla, H. (1990). Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers. In R. P. Reed, & F. R. Fickett (Eds.), Advances in Cryogenic Engineering Materials: Proceedings of the Eighth International Cryogenic Materials Conference (ICMC) held July 24-28, 1989, at UCLA, in Los Angeles, California (pp. 467-471). (Advances in cryogenic engineering; Vol. 36, Part A). Springer. https://doi.org/10.1007/978-1-4613-9880-6_60

de Nivelle, M.J.M.E. ; Hauser, B.W.O. ; Keim, Enrico G. et al. / Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers. Advances in Cryogenic Engineering Materials: Proceedings of the Eighth International Cryogenic Materials Conference (ICMC) held July 24-28, 1989, at UCLA, in Los Angeles, California. editor / R.P. Reed ; F.R. Fickett. New York, NY : Springer, 1990. pp. 467-471 (Advances in cryogenic engineering).

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title = "Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers",

abstract = "Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K. Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.",

author = "\{de Nivelle\}, M.J.M.E. and B.W.O. Hauser and Keim, \{Enrico G.\} and Horst Rogalla",

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doi = "10.1007/978-1-4613-9880-6\_60",

language = "English",

isbn = "978-0-306-43598-0",

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editor = "R.P. Reed and F.R. Fickett",

booktitle = "Advances in Cryogenic Engineering Materials",

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note = "1989 Cryogenic Engineering Conference \& International Cryogenic Materials Conference, CEC/ICMC 1989, CEC/ICMC ; Conference date: 24-07-1989 Through 28-07-1989",

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de Nivelle, MJME, Hauser, BWO, Keim, EG & Rogalla, H 1990, Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers. in RP Reed & FR Fickett (eds), Advances in Cryogenic Engineering Materials: Proceedings of the Eighth International Cryogenic Materials Conference (ICMC) held July 24-28, 1989, at UCLA, in Los Angeles, California. Advances in cryogenic engineering, vol. 36, Part A, Springer, New York, NY, pp. 467-471, 1989 Cryogenic Engineering Conference & International Cryogenic Materials Conference, CEC/ICMC 1989, Los Angeles, United States, 24/07/89. https://doi.org/10.1007/978-1-4613-9880-6_60

Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers. / de Nivelle, M.J.M.E.; Hauser, B.W.O.; Keim, Enrico G. et al.
Advances in Cryogenic Engineering Materials: Proceedings of the Eighth International Cryogenic Materials Conference (ICMC) held July 24-28, 1989, at UCLA, in Los Angeles, California. ed. / R.P. Reed; F.R. Fickett. New York, NY: Springer, 1990. p. 467-471 (Advances in cryogenic engineering; Vol. 36, Part A).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers

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AU - Rogalla, Horst

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N2 - Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K. Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.

AB - Multilayer structures consisting of YBaCuO, Al2O3 and CuO have been sputtered on various substrates. Resistivity measurements show almost no deterioration of the electrical properties of a superconducting YBaCuO film, on top of which first an A12O3 and then an YBaCuO film has been sputtered. First results of YBaCuO films deposited on the A12O3 barrier show a Tcof 65 K. Scanning electron microscopy (SEM) and scanning Auger microscopy (SAM) as applied on a cross section of a multilayer indicate no diffusion between the Al2O3 and YBaCuO layers.

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DO - 10.1007/978-1-4613-9880-6_60

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de Nivelle MJME, Hauser BWO, Keim EG, Rogalla H. Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers. In Reed RP, Fickett FR, editors, Advances in Cryogenic Engineering Materials: Proceedings of the Eighth International Cryogenic Materials Conference (ICMC) held July 24-28, 1989, at UCLA, in Los Angeles, California. New York, NY: Springer. 1990. p. 467-471. (Advances in cryogenic engineering). doi: 10.1007/978-1-4613-9880-6_60

Thin aluminium oxide films as electrical barriers between superconducting Y-Ba-Cu-O layers

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