Thin film plasma deposition of allylamine; effects of solvent treatment

M.T. van Os, Gyula J. Vancso, B. Menges, R. Foerch, W. Knoll

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

13 Citations (Scopus)
Original languageUndefined
Title of host publicationMRS Proceedings
Place of PublicationBoston, USA
Number of pages5
Publication statusPublished - 7 Jan 1999


  • METIS-107299

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