Thiol-ENE chemistry based cross-linked materials for applications in soft lithography

Luis M. Campos; Ines Meinel; Rosette G. Guino; Nalini Gupta; Kato L. Killops; Jos Paulusse; Ryosuke Sakai; Craig J. Hawker

Thiol-ENE chemistry based cross-linked materials for applications in soft lithography

Luis M. Campos, Ines Meinel, Rosette G. Guino, Nalini Gupta, Kato L. Killops, Jos Paulusse, Ryosuke Sakai, Craig J. Hawker

Research output: Contribution to journal › Conference article › Academic › peer-review

1 Citation (Scopus)

Original language	English
Pages (from-to)	232-233
Number of pages	2
Journal	American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume	49
Issue number	1
Publication status	Published - 22 Sep 2008
Externally published	Yes
Event	235th ACS National Meeting 2008: Spring 2008 - New Orleans, United States Duration: 6 Apr 2008 → 10 Apr 2008 Conference number: 235

Cite this

@article{4df59542d4344038be7ca4f89d2849d9,

title = "Thiol-ENE chemistry based cross-linked materials for applications in soft lithography",

author = "Campos, {Luis M.} and Ines Meinel and Guino, {Rosette G.} and Nalini Gupta and Killops, {Kato L.} and Jos Paulusse and Ryosuke Sakai and Hawker, {Craig J.}",

year = "2008",

month = sep,

day = "22",

language = "English",

volume = "49",

pages = "232--233",

journal = "Polymer preprints",

issn = "0032-3934",

publisher = "American Chemical Society",

number = "1",

note = "235th ACS National Meeting 2008 : Spring 2008 ; Conference date: 06-04-2008 Through 10-04-2008",

}

Thiol-ENE chemistry based cross-linked materials for applications in soft lithography. / Campos, Luis M.; Meinel, Ines; Guino, Rosette G.; Gupta, Nalini; Killops, Kato L.; Paulusse, Jos; Sakai, Ryosuke; Hawker, Craig J.

In: American Chemical Society, Polymer Preprints, Division of Polymer Chemistry, Vol. 49, No. 1, 22.09.2008, p. 232-233.

Research output: Contribution to journal › Conference article › Academic › peer-review

TY - JOUR

T1 - Thiol-ENE chemistry based cross-linked materials for applications in soft lithography

AU - Campos, Luis M.

AU - Meinel, Ines

AU - Guino, Rosette G.

AU - Gupta, Nalini

AU - Killops, Kato L.

AU - Paulusse, Jos

AU - Sakai, Ryosuke

AU - Hawker, Craig J.

N1 - Conference code: 235

PY - 2008/9/22

Y1 - 2008/9/22

UR - http://www.scopus.com/inward/record.url?scp=51849135979&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:51849135979

VL - 49

SP - 232

EP - 233

JO - Polymer preprints

JF - Polymer preprints

SN - 0032-3934

IS - 1

T2 - 235th ACS National Meeting 2008

Y2 - 6 April 2008 through 10 April 2008

ER -

Thiol-ENE chemistry based cross-linked materials for applications in soft lithography

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