| Original language | English |
|---|---|
| Pages (from-to) | 232-233 |
| Number of pages | 2 |
| Journal | American Chemical Society, Polymer Preprints, Division of Polymer Chemistry |
| Volume | 49 |
| Issue number | 1 |
| Publication status | Published - 22 Sept 2008 |
| Externally published | Yes |
| Event | 235th ACS National Meeting 2008: Spring 2008 - New Orleans, United States Duration: 6 Apr 2008 → 10 Apr 2008 Conference number: 235 |
Thiol-ENE chemistry based cross-linked materials for applications in soft lithography
Luis M. Campos, Ines Meinel, Rosette G. Guino, Nalini Gupta, Kato L. Killops, Jos Paulusse, Ryosuke Sakai, Craig J. Hawker
Research output: Contribution to journal › Conference article › Academic › peer-review
1
Citation
(Scopus)