Abstract
We present a 3-axis force/torque sensor fabricated in a single SOI wafer. The sensor allows fully differential capacitive readout also for the normal force measurement, without the need for complicated lever mechanisms or wafer bonding. Fabrication is straightforward, with only two masks for deep reactive ion etching and one release etch. Furthermore, out-of-plane displacements are limited by the buried oxide layer thickness which allows for overload protection. The chip has a diameter of 5 mm, a normal force range of 1 N and a torque range from -4 to +4 Nmm and is designed for measuring the interaction forces involved in eye surgery.
| Original language | Undefined |
|---|---|
| Title of host publication | 29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016 |
| Place of Publication | Piscataway, NJ, USA |
| Publisher | IEEE |
| Pages | 885-888 |
| Number of pages | 4 |
| ISBN (Print) | 978-1-5090-1973-1 |
| DOIs | |
| Publication status | Published - 24 Jan 2016 |
| Event | 29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016 - Shanghai, China Duration: 24 Jan 2016 → 28 Jan 2016 Conference number: 29 |
Publication series
| Name | |
|---|---|
| Publisher | IEEE |
Conference
| Conference | 29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016 |
|---|---|
| Abbreviated title | MEMS |
| Country/Territory | China |
| City | Shanghai |
| Period | 24/01/16 → 28/01/16 |
Keywords
- EWI-27766
- IR-103622
- METIS-321732
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