Three dimensional adhesion model for arbitrary rough surfaces

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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21 Downloads (Pure)

Abstract

We present a 3D adhesion model based on the JKR theory applied locally for all contacting asperity couple and the calculations account the van der Waals interaction beside the externally applied force. Thus, equilibrium of the system is determined by an extremum in the free total energy and subsequently the contact and the adhesion parameters are computed for that particular position. The model estimates the adhesion of contacting arbitrary rough surfaces taking into account that asperities deform according to one of the three deformation regimes (elastic, elasto-plastic and plastic). The deformation of the contacting asperities is determined by the material properties, the asperity characteristics as well as the surface topography. Results show that even outside the bonding regime the specific bonding energy is still high enough to cause adhesive problems for microstructures.
Original languageUndefined
Title of host publicationInternational Conference on Computational Nanoscience and Nanotechnology - ICCN 2002
Place of PublicationCambridge, United States
PublisherComputational Publications
Pages326-329
Number of pages4
ISBN (Print)0-9708275-6-3
Publication statusPublished - 21 Apr 2002

Publication series

Name
Volume2

Keywords

  • METIS-206295
  • IR-43288
  • EWI-12694

Cite this

Deladi, S., Krijnen, G. J. M., Tas, N. R., & Elwenspoek, M. C. (2002). Three dimensional adhesion model for arbitrary rough surfaces. In International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002 (pp. 326-329). Cambridge, United States: Computational Publications.
Deladi, S. ; Krijnen, Gijsbertus J.M. ; Tas, Niels Roelof ; Elwenspoek, Michael Curt. / Three dimensional adhesion model for arbitrary rough surfaces. International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002. Cambridge, United States : Computational Publications, 2002. pp. 326-329
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abstract = "We present a 3D adhesion model based on the JKR theory applied locally for all contacting asperity couple and the calculations account the van der Waals interaction beside the externally applied force. Thus, equilibrium of the system is determined by an extremum in the free total energy and subsequently the contact and the adhesion parameters are computed for that particular position. The model estimates the adhesion of contacting arbitrary rough surfaces taking into account that asperities deform according to one of the three deformation regimes (elastic, elasto-plastic and plastic). The deformation of the contacting asperities is determined by the material properties, the asperity characteristics as well as the surface topography. Results show that even outside the bonding regime the specific bonding energy is still high enough to cause adhesive problems for microstructures.",
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Deladi, S, Krijnen, GJM, Tas, NR & Elwenspoek, MC 2002, Three dimensional adhesion model for arbitrary rough surfaces. in International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002. Computational Publications, Cambridge, United States, pp. 326-329.

Three dimensional adhesion model for arbitrary rough surfaces. / Deladi, S.; Krijnen, Gijsbertus J.M.; Tas, Niels Roelof; Elwenspoek, Michael Curt.

International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002. Cambridge, United States : Computational Publications, 2002. p. 326-329.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Three dimensional adhesion model for arbitrary rough surfaces

AU - Deladi, S.

AU - Krijnen, Gijsbertus J.M.

AU - Tas, Niels Roelof

AU - Elwenspoek, Michael Curt

PY - 2002/4/21

Y1 - 2002/4/21

N2 - We present a 3D adhesion model based on the JKR theory applied locally for all contacting asperity couple and the calculations account the van der Waals interaction beside the externally applied force. Thus, equilibrium of the system is determined by an extremum in the free total energy and subsequently the contact and the adhesion parameters are computed for that particular position. The model estimates the adhesion of contacting arbitrary rough surfaces taking into account that asperities deform according to one of the three deformation regimes (elastic, elasto-plastic and plastic). The deformation of the contacting asperities is determined by the material properties, the asperity characteristics as well as the surface topography. Results show that even outside the bonding regime the specific bonding energy is still high enough to cause adhesive problems for microstructures.

AB - We present a 3D adhesion model based on the JKR theory applied locally for all contacting asperity couple and the calculations account the van der Waals interaction beside the externally applied force. Thus, equilibrium of the system is determined by an extremum in the free total energy and subsequently the contact and the adhesion parameters are computed for that particular position. The model estimates the adhesion of contacting arbitrary rough surfaces taking into account that asperities deform according to one of the three deformation regimes (elastic, elasto-plastic and plastic). The deformation of the contacting asperities is determined by the material properties, the asperity characteristics as well as the surface topography. Results show that even outside the bonding regime the specific bonding energy is still high enough to cause adhesive problems for microstructures.

KW - METIS-206295

KW - IR-43288

KW - EWI-12694

M3 - Conference contribution

SN - 0-9708275-6-3

SP - 326

EP - 329

BT - International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002

PB - Computational Publications

CY - Cambridge, United States

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Deladi S, Krijnen GJM, Tas NR, Elwenspoek MC. Three dimensional adhesion model for arbitrary rough surfaces. In International Conference on Computational Nanoscience and Nanotechnology - ICCN 2002. Cambridge, United States: Computational Publications. 2002. p. 326-329