Abstract
Scattering represents a major contribution to the optical propagation losses of channel waveguides. By optimization of the reactive sputtering deposition process, volume scattering can be minimized. In this work, we focus on the reduction of surface scattering by applying a chemical mechanical polishing step following reactive sputter deposition of TiO2 layers. Propagation losses below 0.1 dB/cm at 980 nm of wavelength were experimentally characterized for TiO2 slabs on oxidized silicon wafers. The propagation loss increases to 0.5 dB/cm at 1550 nm of wavelength for fully etched channel waveguides. Such low propagation loss paves the way for the utilization of TiO2 in advanced integrated photonics circuits.
Original language | English |
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Title of host publication | ECIO 2022: 23rd European Conference on Integrated Optics |
Subtitle of host publication | 4th May - 6th May, Milan, Italy |
Place of Publication | Milan |
Publisher | Politecnico di Milano |
Pages | 375-377 |
Number of pages | 4 |
Publication status | Published - 2022 |
Event | 23rd European Conference on Integrated Optics, ECIO 2022 - Milan, Italy Duration: 4 May 2022 → 6 May 2022 Conference number: 23 |
Conference
Conference | 23rd European Conference on Integrated Optics, ECIO 2022 |
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Abbreviated title | ECIO |
Country/Territory | Italy |
City | Milan |
Period | 4/05/22 → 6/05/22 |
Keywords
- Titanium dioxide
- Amorphous
- Chemical mechanical polishing
- Optical propagation loss
- Reactive sputtering