Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide

A. Crunteanu, G. Jänchen, R.P. Salathé, P. Hoffmann, Markus Pollnau, R.W. Eason, D.P. Shepherd

    Research output: Contribution to conferencePaper

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    Abstract

    We were successful in creating 1.4-µm high ribs in a Ti:sapphire planar waveguide by reactive ion etching. Optical investigations of the obtained structure showed channel-waveguide fluorescence emission of the Ti:sapphire layer after Ar-ion excitation.
    Original languageUndefined
    Pages265
    Number of pages1
    DOIs
    Publication statusPublished - May 2002
    EventConference on Lasers and Electro-Optics, CLEO 2002 - Long Beach, CA, Long Beach, United States
    Duration: 19 May 200222 May 2002

    Conference

    ConferenceConference on Lasers and Electro-Optics, CLEO 2002
    Abbreviated titleCLEO
    CountryUnited States
    CityLong Beach
    Period19/05/0222/05/02
    OtherMay 16-24, 2002

    Keywords

    • optical planar waveguides
    • Sapphire
    • IR-71644
    • optical pumping
    • EWI-17931
    • waveguide lasers
    • sputter etching
    • solid lasers
    • Titanium
    • Optical fabrication

    Cite this

    Crunteanu, A., Jänchen, G., Salathé, R. P., Hoffmann, P., Pollnau, M., Eason, R. W., & Shepherd, D. P. (2002). Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide. 265. Paper presented at Conference on Lasers and Electro-Optics, CLEO 2002, Long Beach, United States. https://doi.org/10.1109/CLEO.2002.1033928